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作者:

Ma, He (Ma, He.) (学者:马赫) | Wang, Yu (Wang, Yu.) | Lu, Rong (Lu, Rong.) (学者:戎路) | Tan, Fangrui (Tan, Fangrui.) | Fu, Yulan (Fu, Yulan.) | Wang, Guang (Wang, Guang.) | Wang, Dayong (Wang, Dayong.) (学者:王大勇) | Liu, Kai (Liu, Kai.) | Fan, Shoushan (Fan, Shoushan.) | Jiang, Kaili (Jiang, Kaili.) | Zhang, Xinping (Zhang, Xinping.) (学者:张新平)

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EI SCIE

摘要:

Active terahertz (THz) modulators play an essential role in THz technology. Because of the excellent THz modulation properties bestowed by its intrinsic metal-insulator transition (MIT) at 68 degrees C, vanadium dioxide (VO2) is an appealing active THz modulator material. Current active THz modulator designs based on pure VO2 films or metasurfaces deposited on traditional semiconductor substrates are typically subject to high triggering thresholds and slow responses. Therefore, further development of VO2-active THz modulators for superior performance requires new materials and device designs. In this paper, we develop a flexible active THz modulator based on an aligned carbon nanotube thin film coated with VO2. THz wave modulation driven by the MIT of VO2 presents a giant modulation depth of up to 91% and broad bandwidth (>2.3 THz). Various stimuli can be utilized to trigger the THz modulator. The response time of the THz modulator is 27 ms, which can be further shortened by decreasing the device size. In addition, the light-triggering threshold is quite low (0.58 mW mm(-2)). Optical anisotropy enables polarization of the THz modulator. Since they combine superior modulation performance, responsive stimulus diversity, versatility, and flexibility, these active THz modulators find applications in THz communication, THz imaging, etc.

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作者机构:

  • [ 1 ] [Ma, He]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Yu]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Lu, Rong]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 4 ] [Tan, Fangrui]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 5 ] [Fu, Yulan]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 6 ] [Wang, Dayong]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Xinping]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 8 ] [Wang, Guang]Tsinghua Univ, State Key Lab Low Dimens Quantum Phys, Tsinghua Foxconn Nanotechnol Res Ctr, Dept Phys,Collaborat Innovat Ctr Quantum Matter, Beijing 100084, Peoples R China
  • [ 9 ] [Fan, Shoushan]Tsinghua Univ, State Key Lab Low Dimens Quantum Phys, Tsinghua Foxconn Nanotechnol Res Ctr, Dept Phys,Collaborat Innovat Ctr Quantum Matter, Beijing 100084, Peoples R China
  • [ 10 ] [Jiang, Kaili]Tsinghua Univ, State Key Lab Low Dimens Quantum Phys, Tsinghua Foxconn Nanotechnol Res Ctr, Dept Phys,Collaborat Innovat Ctr Quantum Matter, Beijing 100084, Peoples R China
  • [ 11 ] [Liu, Kai]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

通讯作者信息:

  • 张新平

    [Zhang, Xinping]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF MATERIALS CHEMISTRY C

ISSN: 2050-7526

年份: 2020

期: 30

卷: 8

页码: 10213-10220

6 . 4 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:37

JCR分区:1

被引次数:

WoS核心集被引频次: 16

SCOPUS被引频次: 17

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 2

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