• 综合
  • 标题
  • 关键词
  • 摘要
  • 学者
  • 期刊-刊名
  • 期刊-ISSN
  • 会议名称
搜索

作者:

Guo, Chunsheng (Guo, Chunsheng.) | Ren, Yunxiang (Ren, Yunxiang.) | Gao, Li (Gao, Li.) | Zhu, Hui (Zhu, Hui.) | Li, Shiwei (Li, Shiwei.)

收录:

CPCI-S

摘要:

To explore degradation law and failure mechanisms of AlGaN/GaN HEMT under different temperature conditions, the step-temperature stress experiments are carried out. The results show that the drain-source current decreases with the aging time when the junction temperature range from 139 degrees to 200 degrees; while the drain-source current increases with the aging time when the junction temperature range from 200 degrees to 352 degrees. When the junction temperature is less than 200 degrees, the AlGaN ionized donor atoms cause the Schottky barrier height of the AlGaN/GaN HEMT device to rise; and when the junction temperature is higher than 200 degrees, the diffusion of impurities oxygen in surface causes the Schottky barrier height of the AlGaN/GaN HEMT device to fall. The barrier height can affect the threshold voltage which leads to the change of drain-source current. Therefore, the degradation of the drain-source current is caused by the change of the Schottky barrier height.

关键词:

AlGaN/GaN HEMT junction temperature the Schottky barrier

作者机构:

  • [ 1 ] [Guo, Chunsheng]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Ren, Yunxiang]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Zhu, Hui]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Shiwei]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Gao, Li]China Elect Standardizat Inst, Beijing 100176, Peoples R China

通讯作者信息:

  • [Guo, Chunsheng]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

查看成果更多字段

相关关键词:

相关文章:

来源 :

PROCEEDINGS OF THE 2ND INTERNATIONAL CONFERENCE ON ADVANCES IN MECHANICAL ENGINEERING AND INDUSTRIAL INFORMATICS (AMEII 2016)

ISSN: 2352-5401

年份: 2016

卷: 73

页码: 995-1000

语种: 英文

被引次数:

WoS核心集被引频次: 1

SCOPUS被引频次:

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 0

归属院系:

在线人数/总访问数:1632/4241811
地址:北京工业大学图书馆(北京市朝阳区平乐园100号 邮编:100124) 联系我们:010-67392185
版权所有:北京工业大学图书馆 站点建设与维护:北京爱琴海乐之技术有限公司