We　propose　the　fabrication　of　two　types　high　performance　texturized　antireflective　structures　on　crystalline　(100)　silicon　(c-Si)　surface　by　hybrid　picosecond　laser　scanning　irradiation　followed　by　chemical　corrosion.　The　design　and　the　fabrication　with　high　controllable　performance　were　studied.　The　hybrid　method　includes　1064　nm　picosecond　(ps)　laser　scanning　to　form　micro-hole　array　and　subsequently　short-time　alkaline　corrosion.　After　ps　laser　processing,　there　is　little　reconsolidation　and　heat　affect　zone　on　the　silicon　surface,　which　is　beneficial　to　achieve　the　precise　chemical　corrosion　effect.　Depending　on　the　laser　scanning　intervals,　scanning　times　and　chemical　corrosion　time,　a　variety　of　surface　texture　morphologies,　even　a　special　micro-nano　hierarchical　structure　in　which　finer　nano-structures　formed　in　the　micro　units　of　the　texture,　were　achieved.　Observing　with　SEM,　the　average　diameter　of　the　micro-holes　in　the　micro-nano　hierarchica　is　25　similar　to　30　mu　m,　while　the　average　size　of　the　nano-level　ladder-like　structures　on　the　micro-hole　wall　is　from　dozens　to　hundreds　of　nanometers.　Comparing　to　the　traditional　laser　texturing　techniques　for　c-Si　solar　cell,　the　whole　laser　processing　was　carried　out　in　an　open　air　ambient　without　using　etch　mask　and　SF6/O-2　plasma.　The　results　show　the　reflectance　value　of　the　fabricated　c-Si　surfaces　can　reach　as　low　as　6%　(400　nm　similar　to　1000　nm).　This　is　a　potential　method　for　economical　antireflective　structures　fabrication　which　is　ideal　for　using　in　the　high-efficiency　silicon-based　photoelectronic　devices.