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作者:

Pan, Lei (Pan, Lei.) | Grutter, Alexander (Grutter, Alexander.) | Zhang, Peng (Zhang, Peng.) | Che, Xiaoyu (Che, Xiaoyu.) | Nozaki, Tomohiro (Nozaki, Tomohiro.) | Stern, Alex (Stern, Alex.) | Street, Mike (Street, Mike.) | Zhang, Bing (Zhang, Bing.) | Casas, Brian (Casas, Brian.) | He, Qing Lin (He, Qing Lin.) | Choi, Eun Sang (Choi, Eun Sang.) | Disseler, Steven M. (Disseler, Steven M..) | Gilbert, Dustin A. (Gilbert, Dustin A..) | Yin, Gen (Yin, Gen.) | Shao, Qiming (Shao, Qiming.) | Deng, Peng (Deng, Peng.) | Wu, Yingying (Wu, Yingying.) | Liu, Xiaoyang (Liu, Xiaoyang.) | Kou, Xufeng (Kou, Xufeng.) | Masashi, Sahashi (Masashi, Sahashi.) | Han, Xiaodong (Han, Xiaodong.) (学者:韩晓东) | Binek, Christian (Binek, Christian.) | Chambers, Scott (Chambers, Scott.) | Xia, Jing (Xia, Jing.) | Wang, Kang L. (Wang, Kang L..)

收录:

EI Scopus SCIE PubMed

摘要:

Integration of a quantum anomalous Hall insulator with a magnetically ordered material provides an additional degree of freedom through which the resulting exotic quantum states can be controlled. Here, an experimental observation is reported of the quantum anomalous Hall effect in a magnetically-doped topological insulator grown on the antiferromagnetic insulator Cr2O3. The exchange coupling between the two materials is investigated using field-cooling-dependent magnetometry and polarized neutron reflectometry. Both techniques reveal strong interfacial interaction between the antiferromagnetic order of the Cr(2)O(3)and the magnetic topological insulator, manifested as an exchange bias when the sample is field-cooled under an out-of-plane magnetic field, and an exchange spring-like magnetic depth profile when the system is magnetized within the film plane. These results identify antiferromagnetic insulators as suitable candidates for the manipulation of magnetic and topological order in topological insulator films.

关键词:

antiferromagnet topological insulators quantum anomalous Hall effect

作者机构:

  • [ 1 ] [Pan, Lei]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 2 ] [Zhang, Peng]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 3 ] [Che, Xiaoyu]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 4 ] [He, Qing Lin]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 5 ] [Yin, Gen]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 6 ] [Shao, Qiming]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 7 ] [Deng, Peng]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 8 ] [Wu, Yingying]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 9 ] [Wang, Kang L.]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA
  • [ 10 ] [Grutter, Alexander]NIST, Ctr Neutron Res, Gaithersburg, MD 20899 USA
  • [ 11 ] [Disseler, Steven M.]NIST, Ctr Neutron Res, Gaithersburg, MD 20899 USA
  • [ 12 ] [Nozaki, Tomohiro]Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
  • [ 13 ] [Masashi, Sahashi]Tohoku Univ, Dept Elect Engn, Sendai, Miyagi 9808579, Japan
  • [ 14 ] [Stern, Alex]Univ Calif Irvine, Dept Phys & Astron, Irvine, CA 92697 USA
  • [ 15 ] [Casas, Brian]Univ Calif Irvine, Dept Phys & Astron, Irvine, CA 92697 USA
  • [ 16 ] [Xia, Jing]Univ Calif Irvine, Dept Phys & Astron, Irvine, CA 92697 USA
  • [ 17 ] [Street, Mike]Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
  • [ 18 ] [Binek, Christian]Univ Nebraska, Dept Phys & Astron, Lincoln, NE 68588 USA
  • [ 19 ] [Zhang, Bing]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 20 ] [Han, Xiaodong]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 21 ] [He, Qing Lin]Peking Univ, Sch Phys, Int Ctr Quantum Mat, Beijing 100871, Peoples R China
  • [ 22 ] [Choi, Eun Sang]Florida State Univ, Natl High Magnet Field Lab, Tallahassee, FL 32310 USA
  • [ 23 ] [Gilbert, Dustin A.]Univ Tennessee, Dept Mat Sci, Knoxville, TN 37996 USA
  • [ 24 ] [Shao, Qiming]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Kowloon, Clear Water Bay, Hong Kong, Peoples R China
  • [ 25 ] [Liu, Xiaoyang]ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 200031, Peoples R China
  • [ 26 ] [Kou, Xufeng]ShanghaiTech Univ, Sch Informat Sci & Technol, Shanghai 200031, Peoples R China
  • [ 27 ] [Chambers, Scott]Pacific Northwest Natl Lab, Phys & Computat Sci Directorate, Richland, WA 99352 USA
  • [ 28 ] [Wang, Kang L.]Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA
  • [ 29 ] [Wang, Kang L.]Univ Calif Los Angeles, Dept Phys, Los Angeles, CA 90095 USA

通讯作者信息:

  • [Wang, Kang L.]Univ Calif Los Angeles, Dept Elect & Comp Engn, Los Angeles, CA 90095 USA;;[Wang, Kang L.]Univ Calif Los Angeles, Dept Mat Sci & Engn, Los Angeles, CA 90095 USA;;[Wang, Kang L.]Univ Calif Los Angeles, Dept Phys, Los Angeles, CA 90095 USA

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来源 :

ADVANCED MATERIALS

ISSN: 0935-9648

年份: 2020

期: 34

卷: 32

2 9 . 4 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:169

被引次数:

WoS核心集被引频次: 32

SCOPUS被引频次: 33

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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