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作者:

Jing, Lin (Jing, Lin.) | Zhu, Ruixue (Zhu, Ruixue.) | Ng, Yun Hau (Ng, Yun Hau.) | Hu, Zhuofeng (Hu, Zhuofeng.) | Teoh, Wey Yang (Teoh, Wey Yang.) | Phillips, David Lee (Phillips, David Lee.) | Yu, Jimmy C. (Yu, Jimmy C..)

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摘要:

Elemental red phosphorus (red P) is a new class of photocatalysts with a desirable bandgap of similar to 1.7 eV and has a strong visible-light response. Here, we show that the efficiency of red P is limited by severe electron trapping at deep traps that are intrinsic to the different crystal facets of the red P. To overcome this, we synthesized the red P/RGO (reduced graphene oxide) composite in a one-step ampoule chemical vapor deposition synthesis that formed a conducive interface between the red P photocatalyst and the RGO acceptor for efficient interfacial charge transport. As substantiated through photoelectrochemical characterization and ultrafast (femtoseconds) transient absorption spectroscopy, the interfacing with RGO provided a rapid pathway for the photocharges in red P to be interfacially separated, thereby circumventing the slower the charge trapping process. As a result, up to a sevenfold increase in the photocatalytic hydrogen production rate (apparent quantum yield = 3.1% at 650 nm) was obtained for the red P/RGO relative to the pristine red P.

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作者机构:

  • [ 1 ] [Jing, Lin]Chinese Univ Hong Kong, Dept Chem, Hong Kong, Peoples R China
  • [ 2 ] [Hu, Zhuofeng]Chinese Univ Hong Kong, Dept Chem, Hong Kong, Peoples R China
  • [ 3 ] [Yu, Jimmy C.]Chinese Univ Hong Kong, Dept Chem, Hong Kong, Peoples R China
  • [ 4 ] [Jing, Lin]Beijing Univ Technol, Coll Environm & Energy Engn, Beijing, Peoples R China
  • [ 5 ] [Zhu, Ruixue]Univ Hong Kong, Dept Chem, Pokfulam Rd, Hong Kong, Peoples R China
  • [ 6 ] [Phillips, David Lee]Univ Hong Kong, Dept Chem, Pokfulam Rd, Hong Kong, Peoples R China
  • [ 7 ] [Ng, Yun Hau]Univ New South Wales, Sch Chem Engn, Sydney, NSW 2052, Australia
  • [ 8 ] [Teoh, Wey Yang]Univ New South Wales, Sch Chem Engn, Sydney, NSW 2052, Australia

通讯作者信息:

  • [Yu, Jimmy C.]Chinese Univ Hong Kong, Dept Chem, Hong Kong, Peoples R China

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来源 :

JOURNAL OF CHEMICAL PHYSICS

ISSN: 0021-9606

年份: 2020

期: 2

卷: 153

4 . 4 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:100

被引次数:

WoS核心集被引频次: 16

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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