The　exposure　schedule　model　of　uniform　diffraction　efficiency　in　single　monomer　photopolymer　is　extended　to　that　in　dual　monomers　with　partially-overlapping　multiplexing　methods.　The　proposed　model　can　be　thought　of　solving　an　optimization　problem.　The　exposure　schedule　for　51　holograms　are　calculated　and　verified　by　the　numerical　simulation.　The　result　shows　that　the　exposure　schedule　is　effective　to　produce　the　uniform　diffraction　efficiency　for　the　multiplexing　holographic　storage.