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作者:

Chen Liang (Chen Liang.) | Zhang Wan-rong (Zhang Wan-rong.) | Jin Dong-yue (Jin Dong-yue.) | Ding Chun-bao (Ding Chun-bao.) | Zhang Yu-jie (Zhang Yu-jie.) | Lu Zhi-yi (Lu Zhi-yi.)

收录:

CPCI-S

摘要:

The effect of bandgap engineering on I-C-V-BE fly-back characteristic of power SiGe heterojunction bipolar transistor is studied through theoretical analysis, computer simulations, and experimental measurements. It is found that because of the existence of Ge composition,SiGe Heterojunction Bipolar Transistors have better thermal stability compared with homojunction bipolar transistors under the same operating condition which will be beneficial to decrease the emitter ballast resistance of HBT and improve the performance of transistor. And the greater Ge composition is, the more stable the HBT is

关键词:

Bandgap Engineering fly-back characteristic SiGe HBTs

作者机构:

  • [ 1 ] [Chen Liang]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang Wan-rong]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Jin Dong-yue]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Ding Chun-bao]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Zhang Yu-jie]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Lu Zhi-yi]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • [Chen Liang]Beijing Univ Technol, Coll Elect Informat & Control Engn, Beijing 100124, Peoples R China

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来源 :

2011 INTERNATIONAL CONFERENCE OF ELECTRON DEVICES AND SOLID-STATE CIRCUITS (EDSSC)

年份: 2011

语种: 英文

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