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作者:

Wang, Ye (Wang, Ye.) | Meng, Junhua (Meng, Junhua.) (学者:孟军华) | Tian, Yan (Tian, Yan.) | Chen, Yanan (Chen, Yanan.) | Wang, Gaokai (Wang, Gaokai.) | Yin, Zhigang (Yin, Zhigang.) | Jin, Peng (Jin, Peng.) | You, Jingbi (You, Jingbi.) | Wu, Jinliang (Wu, Jinliang.) | Zhang, Xingwang (Zhang, Xingwang.)

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摘要:

Recently, the deep ultraviolet (DUV) photodetectors fabricated from two-dimensional (2D) hexagonal boron nitride (h-BN) layers have emerged as a hot research topic. However, the existing studies show that the h-BN-based photodetectors have relatively poor performance. In this work, C doping is utilized to modulate the properties of h-BN and improve the performance of the h-BN-based photodetectors. We synthesized the h-BN atomic layers with various C concentrations varying from 0 to 10.2 atom % by ion beam sputtering deposition through controlling the sputtering atmosphere. The h-BN phase remains stable when a small amount of C is incorporated into h-BN, whereas the introduction of a large amount of C impurities leads to the rapidly deteriorated crystallinity of h-BN. Furthermore, the DUV photodetectors based on C-doped h-BN layers were fabricated, and the h-BN-based photodetector with 7.5 atom % C exhibits the best performance with a responsivity of 9.2 mA.W-1, which is significantly higher than that of the intrinsic h-BN device. This work demonstrates that the C doping is a feasible and effective method for improving the performance of h-BN photodetectors.

关键词:

two-dimensional materials doping hexagonal boron-carbon-nitrogen hexagonal boron nitride ion beam sputtering deposition deep ultraviolet photodetectors

作者机构:

  • [ 1 ] [Meng, Junhua]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Ye]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 3 ] [Tian, Yan]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 4 ] [Chen, Yanan]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 5 ] [Wang, Gaokai]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 6 ] [Yin, Zhigang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 7 ] [Jin, Peng]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 8 ] [You, Jingbi]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 9 ] [Wu, Jinliang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 10 ] [Zhang, Xingwang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 11 ] [Wang, Ye]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 12 ] [Tian, Yan]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 13 ] [Chen, Yanan]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 14 ] [Wang, Gaokai]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 15 ] [Yin, Zhigang]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 16 ] [Jin, Peng]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 17 ] [You, Jingbi]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 18 ] [Zhang, Xingwang]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

通讯作者信息:

  • 孟军华

    [Meng, Junhua]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China;;[Zhang, Xingwang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China;;[Zhang, Xingwang]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China

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来源 :

ACS APPLIED MATERIALS & INTERFACES

ISSN: 1944-8244

年份: 2020

期: 24

卷: 12

页码: 27361-27367

9 . 5 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:169

被引次数:

WoS核心集被引频次: 51

SCOPUS被引频次: 54

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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