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Author:

Wang Xiaolei (Wang Xiaolei.) (Scholars:王晓蕾) | Pan Dong (Pan Dong.) | Zeng Qingqi (Zeng Qingqi.) | Chen Xue (Chen Xue.) | Wang Hailong (Wang Hailong.) | Zhao Duo (Zhao Duo.) | Xu Zhiyang (Xu Zhiyang.) | Yang Qianqian (Yang Qianqian.) | Deng Jinxiang (Deng Jinxiang.) (Scholars:邓金祥) | Zhai Tianrui (Zhai Tianrui.) (Scholars:翟天瑞) | Wu Guangheng (Wu Guangheng.) | Liu Enke (Liu Enke.) | Zhao Jianhua (Zhao Jianhua.)

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Abstract:

Topological Weyl semimetals have attracted considerable interest because they manifest underlying physics and device potential in spintronics. Large anomalous Hall effect (AHE) in non-collinear antiferromagnets (AFMs) represents a striking Weyl phase, which is associated with Bloch-band topological features. In this work, we report robust AHE and Lifshitz transition in high-quality Weyl semimetal Mn3Ge thin film, comprising stacked Kagome lattice and chiral antiferromagnetism. We successfully achieved giant AHE in our Mn3Ge film, with a strong Berry curvature enhanced by the Weyl phase. The enormous coercive field HC in our AHE curve at 5 K reached an unprecedented 5.3 T among hexagonal Mn3X systems. Our results provide direct experimental evidence of an electronic topological transition in the chiral AFMs. The temperature was demonstrated to play an efficient role in tuning the carrier concentration, which could be quantitatively determined by the two-band model. The electronic band structure crosses the Fermi energy level and leads to the reversal of carrier type around 50 K. The results not only offer new functionality for effectively modulating the Fermi level location in topological Weyl semimetals but also present a promising route of manipulating the carrier concentration in antiferromagnetic spintronic devices.

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Author Community:

  • [ 1 ] [Wang Xiaolei]State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China. xiaoleiwang@bjut.edu.cn and College of Physics and Optoelectronics, Faculty of Science, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Pan Dong]State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China. xiaoleiwang@bjut.edu.cn
  • [ 3 ] [Zeng Qingqi]State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
  • [ 4 ] [Chen Xue]Engineering Research Center for Semiconductor Integrated Technology, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China
  • [ 5 ] [Wang Hailong]State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China. xiaoleiwang@bjut.edu.cn
  • [ 6 ] [Zhao Duo]State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China. xiaoleiwang@bjut.edu.cn
  • [ 7 ] [Xu Zhiyang]College of Physics and Optoelectronics, Faculty of Science, Beijing University of Technology, Beijing 100124, China
  • [ 8 ] [Yang Qianqian]College of Physics and Optoelectronics, Faculty of Science, Beijing University of Technology, Beijing 100124, China
  • [ 9 ] [Deng Jinxiang]College of Physics and Optoelectronics, Faculty of Science, Beijing University of Technology, Beijing 100124, China
  • [ 10 ] [Zhai Tianrui]College of Physics and Optoelectronics, Faculty of Science, Beijing University of Technology, Beijing 100124, China
  • [ 11 ] [Wu Guangheng]State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
  • [ 12 ] [Liu Enke]State Key Laboratory of Magnetism, Institute of Physics, Chinese Academy of Sciences, Beijing 100190, China
  • [ 13 ] [Zhao Jianhua]State Key Laboratory of Superlattices and Microstructures, Institute of Semiconductors, Chinese Academy of Sciences, Beijing 100083, China. xiaoleiwang@bjut.edu.cn

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Source :

Nanoscale

ISSN: 2040-3372

Year: 2021

Issue: 4

Volume: 13

Page: 2601-2608

6 . 7 0 0

JCR@2022

ESI HC Threshold:72

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count: 16

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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