• 综合
  • 标题
  • 关键词
  • 摘要
  • 学者
  • 期刊-刊名
  • 期刊-ISSN
  • 会议名称
搜索

作者:

Guo, Qixun (Guo, Qixun.) | Wu, Yu (Wu, Yu.) | Wang, Dongwei (Wang, Dongwei.) | Han, Gang (Han, Gang.) | Wang, Xuemin (Wang, Xuemin.) | Fu, Libo (Fu, Libo.) | Wang, Lihua (Wang, Lihua.) (学者:王立华) | He, Wei (He, Wei.) | Zhu, Tao (Zhu, Tao.) | Zhu, Zhendong (Zhu, Zhendong.) | Liu, Tao (Liu, Tao.) | Yu, Guanghua (Yu, Guanghua.) | Teng, Jiao (Teng, Jiao.)

收录:

EI SCIE

摘要:

Negative magnetoresistance (MR) is not only of great fundamental interest for condensed matter physics and materials science, but also important for practical applications, especially magnetic data storage and sensors. However, the microscopic origin of negative MR is still elusive and the nature of the negative MR in magnetic topological insulators has still not been completely elucidated. Here, we report magnetotransport studies on Cr doped (Bi1-xSbx)(2)Te-3 topological insulator thin films grown by magnetron sputtering. At the temperature of 2 K, a giant negative MR reaching 61% is observed at H = 2 T. We show that the negative MR is closely related to the position of the Fermi level, and it reaches the maximum when the Fermi level is gated near the charge neutral point. We attribute these results to the Coulomb potential due to the random composition fluctuations in Cr doped (Bi1-xSbx)(2)Te-3. Our results provide a deeper insight into the mechanism of negative MR, and are helpful to realize the quantum anomalous Hall effect in the sputtered Cr-(Bi1-xSbx)(2)Te-3 thin-film systems by tuning the Fermi level and reducing disorder effects.

关键词:

作者机构:

  • [ 1 ] [Guo, Qixun]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 2 ] [Wu, Yu]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 3 ] [Yu, Guanghua]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 4 ] [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China
  • [ 5 ] [Wu, Yu]Beijing Tongfang Huachuang Technol Co Ltd, Beijing 100089, Peoples R China
  • [ 6 ] [Wang, Dongwei]Natl Ctr Nanosci & Technol, CAS Key Lab Standardizat & Measurement Nanotechno, Beijing 100190, Peoples R China
  • [ 7 ] [Han, Gang]Univ Sci & Technol Beijing, Collaborat Innovat Ctr Adv Steel Technol, Beijing 100083, Peoples R China
  • [ 8 ] [Wang, Xuemin]Univ Sci & Technol Beijing, Collaborat Innovat Ctr Adv Steel Technol, Beijing 100083, Peoples R China
  • [ 9 ] [Fu, Libo]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 10 ] [Wang, Lihua]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 11 ] [He, Wei]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 12 ] [Zhu, Tao]Chinese Acad Sci, Beijing Natl Lab Condensed Matter Phys, Beijing 100190, Peoples R China
  • [ 13 ] [He, Wei]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 14 ] [Zhu, Tao]Chinese Acad Sci, Inst Phys, Beijing 100190, Peoples R China
  • [ 15 ] [Zhu, Zhendong]Natl Inst Metrol, Beijing 100029, Peoples R China
  • [ 16 ] [Liu, Tao]Univ Elect Sci & Technol China, Natl Engn Res Ctr Electromagnet Radiat Control Ma, Chengdu 610054, Peoples R China

通讯作者信息:

  • [Teng, Jiao]Univ Sci & Technol Beijing, Dept Mat Phys & Chem, Beijing 100083, Peoples R China

电子邮件地址:

查看成果更多字段

相关关键词:

相关文章:

来源 :

RSC ADVANCES

年份: 2021

期: 23

卷: 11

页码: 13964-13969

3 . 9 0 0

JCR@2022

ESI学科: CHEMISTRY;

ESI高被引阀值:7

被引次数:

WoS核心集被引频次: 2

SCOPUS被引频次: 2

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 3

在线人数/总访问数:1386/2984782
地址:北京工业大学图书馆(北京市朝阳区平乐园100号 邮编:100124) 联系我们:010-67392185
版权所有:北京工业大学图书馆 站点建设与维护:北京爱琴海乐之技术有限公司