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[期刊论文]

A Third Order BDF Energy Stable Linear Scheme for the No-Slope-Selection Thin Film Model

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Author:

Hao, Yonghong (Hao, Yonghong.) | Huang, Qiumei (Huang, Qiumei.) (Scholars:黄秋梅) | Wang, Cheng (Wang, Cheng.)

Indexed by:

Scopus SCIE

Abstract:

In this paper we propose and analyze a (temporally) third order accurate backward differentiation formula (BDF) numerical scheme for the no-slope-selection (NSS) equation of the epitaxial thin film growth model, with Fourier pseudo-spectral discretization in space. The surface diffusion term is treated implicitly, while the nonlinear chemical potential is approximated by a third order explicit extrapolation formula for the sake of solvability. In addition, a third order accurate Douglas-Dupont regularization term, in the form of -A Delta t(2)Delta N-2(un+1-un), is added in the numerical scheme. A careful energy stability estimate, combined with Fourier eigenvalue analysis, results in the energy stability in a modified version, and a theoretical justification of the coefficient A becomes available. As a result of this energy stability analysis, a uniform in time bound of the numerical energy is obtained. And also, the optimal rate convergence analysis and error estimate are derived in details, in the l(infinity)(0, T;l(2)) boolean AND l(2)(0,T;Hh(2)) norm, with the help of a linearized estimate for the nonlinear error terms. Some numerical simulation results are presented to demonstrate the efficiency of the numerical scheme and the third order convergence. The long time simulation results for epsilon = 0.02 (up to T = 3x10(5)) have indicated a logarithm law for the energy decay, as well as the power laws for growth of the surface roughness and the mound width. In particular, the power index for the surface roughness and the mound width growth, created by the third order numerical scheme, is more accurate than those produced by certain second order energy stable schemes in the existing literature.

Keyword:

third order backward differentiation formula energy stability optimal rate convergence analysis no-slope-selection Epitaxial thin film growth

Author Community:

  • [ 1 ] [Hao, Yonghong]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 2 ] [Huang, Qiumei]Beijing Univ Technol, Coll Appl Sci, Beijing 100124, Peoples R China
  • [ 3 ] [Wang, Cheng]Univ Massachusetts, Dept Math, N Dartmouth, MA 02747 USA

Reprint Author's Address:

  • [Wang, Cheng]Univ Massachusetts, Dept Math, N Dartmouth, MA 02747 USA

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Source :

COMMUNICATIONS IN COMPUTATIONAL PHYSICS

ISSN: 1815-2406

Year: 2021

Issue: 3

Volume: 29

Page: 905-929

3 . 7 0 0

JCR@2022

ESI Discipline: PHYSICS;

ESI HC Threshold:72

JCR Journal Grade:1

Cited Count:

WoS CC Cited Count: 48

SCOPUS Cited Count: 53

ESI Highly Cited Papers on the List: 3 Unfold All

  • 2022-3
  • 2022-3
  • 2022-3

30 Days PV: 1

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