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作者:

Lu, CZ (Lu, CZ.) | Feng, SW (Feng, SW.) (学者:冯士维) | Wang, DF (Wang, DF.) | Zhu, XD (Zhu, XD.) | Fan, ZF (Fan, ZF.) | Morkoc, H (Morkoc, H.)

收录:

CPCI-S

摘要:

AlGaN/GaN double heterostructure high electron mobility transistor (DH-HEMT's) with a 2.0 mu m gate length and a 4 mu m channel length exhibiting good temperature characteristics has been demonstrated. The maximum drain current I-ds and extrinsic transconductance G(m) are 1300mA/mm 235mS/mm, 850mA/mm 174mS/mm and 475mA/mm 95mS/rnm, respectively at T = 194 degrees C, 20 degrees C and 400 degrees C. The temperature coefficient of I-ds and G are -1.4mA/degrees C and -0.24mS/degrees C respectively.

关键词:

AlGaN/GaN double heterostructure HEMT temperature characteristics

作者机构:

  • [ 1 ] Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100022, Peoples R China

通讯作者信息:

  • [Lu, CZ]Beijing Univ Technol, Sch Elect Informat & Control Engn, Beijing 100022, Peoples R China

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来源 :

2004: 7TH INTERNATIONAL CONFERENCE ON SOLID-STATE AND INTEGRATED CIRCUITS TECHNOLOGY, VOLS 1- 3, PROCEEDINGS

年份: 2004

页码: 2284-2286

语种: 英文

被引次数:

WoS核心集被引频次: 1

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