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作者:

Wang, Jianqiang (Wang, Jianqiang.) | Ru, Xiaoning (Ru, Xiaoning.) | Ruan, Tianyu (Ruan, Tianyu.) | Hu, Yunfei (Hu, Yunfei.) | Zhang, Yongzhe (Zhang, Yongzhe.) (学者:张永哲) | Yan, Hui (Yan, Hui.) (学者:严辉)

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SCIE

摘要:

The effect of plasma excitation frequency on the performance of intrinsic hydrogenated amorphous silicon (a-Si:H) films and heterojunction solar cells by radio-frequency (RF, 13.56 MHZ) and very-high-frequency (VHF, 40 MHZ) plasma-enhanced chemical vapor deposition (PECVD) have been investigated. The thickness and microstructure of intrinsic a-Si:H films were measured by spectroscopic ellipsometry and Fourier transform infrared spectroscopy (FTIR). The a-Si:H/c-Si interface passivation quality were determined by minority carrier lifetime and transmission electron microscopy (TEM). The current-voltage (I-V) performance of the HJT solar cells were also evaluated. The results reveal that a-Si:H films developed by RF-PECVD with a large area of parallel-plate reactors (> 1 m(2)) exhibit better thickness uniformity, lower microstructure factor, and higher minority carrier lifetimes. Hence HJT solar cells have achieved efficiency of 24.9%, compared with cell efficiency of 24.6% with intrinsic a-Si:H films developed by VHF-PECVD.

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作者机构:

  • [ 1 ] [Wang, Jianqiang]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China
  • [ 2 ] [Ruan, Tianyu]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China
  • [ 4 ] [Yan, Hui]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China
  • [ 5 ] [Ru, Xiaoning]Chengdu R&D Ctr, Hanergy Thin Film Power Grp, Chengdu 610200, Sichuan, Peoples R China
  • [ 6 ] [Hu, Yunfei]Shenzhen Technol Univ, Coll New Mat & New Energies, Shenzhen 518118, Peoples R China

通讯作者信息:

  • 张永哲 严辉

    [Zhang, Yongzhe]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China;;[Yan, Hui]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Property Adv Mat, Key Lab Adv Funct Mat,Educ Minist China, Beijing 100124, Peoples R China;;[Hu, Yunfei]Shenzhen Technol Univ, Coll New Mat & New Energies, Shenzhen 518118, Peoples R China

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来源 :

JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS

ISSN: 0957-4522

年份: 2021

期: 20

卷: 32

页码: 25327-25331

2 . 8 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:8

被引次数:

WoS核心集被引频次: 6

SCOPUS被引频次: 6

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

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