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摘要:
The effect of plasma excitation frequency on the performance of intrinsic hydrogenated amorphous silicon (a-Si:H) films and heterojunction solar cells by radio-frequency (RF, 13.56 MHZ) and very-high-frequency (VHF, 40 MHZ) plasma-enhanced chemical vapor deposition (PECVD) have been investigated. The thickness and microstructure of intrinsic a-Si:H films were measured by spectroscopic ellipsometry and Fourier transform infrared spectroscopy (FTIR). The a-Si:H/c-Si interface passivation quality were determined by minority carrier lifetime and transmission electron microscopy (TEM). The current-voltage (I-V) performance of the HJT solar cells were also evaluated. The results reveal that a-Si:H films developed by RF-PECVD with a large area of parallel-plate reactors (> 1 m(2)) exhibit better thickness uniformity, lower microstructure factor, and higher minority carrier lifetimes. Hence HJT solar cells have achieved efficiency of 24.9%, compared with cell efficiency of 24.6% with intrinsic a-Si:H films developed by VHF-PECVD.
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来源 :
JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS
ISSN: 0957-4522
年份: 2021
期: 20
卷: 32
页码: 25327-25331
2 . 8 0 0
JCR@2022
ESI学科: MATERIALS SCIENCE;
ESI高被引阀值:8