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作者:

Qiu, Pingping (Qiu, Pingping.) | Wu, Bo (Wu, Bo.) | Fu, Pan (Fu, Pan.) | Li, Ming (Li, Ming.) | Xie, Yiyang (Xie, Yiyang.) | Kan, Qiang (Kan, Qiang.)

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SCIE

摘要:

The SiO2/SiNx dielectric film stacks deposited by inductively coupled plasma chemical vapor deposition (ICP-CVD) are employed on the top of the oxide-confined vertical-cavity surface-emitting lasers (VCSELs). The reflecting mirror characteristics of the dielectric films are measured with varying numbers of pairs from 4 to 12. The prepared devices have low threshold current of 0.3 mA, single-mode peak power of 1.4 mW at room temperature. The thermal resistance of the device depending on ambient temperature is estimated according to the relationship of wavelength shift and dissipated power, allowing us to extract the actual temperature in active region and the temperature dependence of the output characteristics of the VCSEL. The beam property of the device is characterized by the far field pattern (FFP). Depending on the drive current, the average divergence angles of the output beam estimated from the full-width-half-maximum (FWHM) of the FFP varies between 20.4 degrees and 21.2 degrees. Furthermore, polarization-controlled single mode emission is achieved by introducing a built-in grating into the VCSEL with orthogonal polarization suppression ratio (OPSR) around 19 dB.

关键词:

dielectric distributed Bragg reflectors polarization stable device Semiconductor laser single fundamental mode vertical-cavity surface-emitting lasers

作者机构:

  • [ 1 ] [Qiu, Pingping]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 2 ] [Li, Ming]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 3 ] [Kan, Qiang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China
  • [ 4 ] [Qiu, Pingping]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 5 ] [Li, Ming]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 6 ] [Kan, Qiang]Univ Chinese Acad Sci, Ctr Mat Sci & Optoelect Engn, Beijing 100049, Peoples R China
  • [ 7 ] [Qiu, Pingping]Beijing Key Lab Low Dimens Semicond Mat & Devices, Beijing 100083, Peoples R China
  • [ 8 ] [Li, Ming]Beijing Key Lab Low Dimens Semicond Mat & Devices, Beijing 100083, Peoples R China
  • [ 9 ] [Kan, Qiang]Beijing Key Lab Low Dimens Semicond Mat & Devices, Beijing 100083, Peoples R China
  • [ 10 ] [Wu, Bo]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 11 ] [Fu, Pan]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 12 ] [Xie, Yiyang]Beijing Univ Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China

通讯作者信息:

  • [Kan, Qiang]Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China

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来源 :

IEEE PHOTONICS JOURNAL

ISSN: 1943-0655

年份: 2021

期: 4

卷: 13

2 . 4 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:7

被引次数:

WoS核心集被引频次: 13

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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