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作者:

Zhou, Xian-Gang (Zhou, Xian-Gang.) | Yang, Chen-Quan (Yang, Chen-Quan.) | Sang, Xiahan (Sang, Xiahan.) | Li, Wei (Li, Wei.) | Wang, Li (Wang, Li.) | Yin, Zhi-Wen (Yin, Zhi-Wen.) | Han, Jing-Ru (Han, Jing-Ru.) | Li, Yu (Li, Yu.) | Ke, Xiaoxing (Ke, Xiaoxing.) | Hu, Zhi-Yi (Hu, Zhi-Yi.) | Cheng, Yi-Bing (Cheng, Yi-Bing.) | Van Tendeloo, Gustaaf (Van Tendeloo, Gustaaf.)

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EI Scopus SCIE

摘要:

A deep understanding of the fine structure at the atomic scale of halide perovskite materials has been limited by their sensitivity to the electron beam that is widely used for structural characterization. The sensitivity of a gamma-CsPbIBr2 perovskite thin film under electron beam irradiation is revealed by scanning transmission electron microscopy (STEM) through a universal large-range electron dose measurement, which is based on discrete single-electron events in the STEM mode. Our research indicates that the gamma-CsPbIBr2 thin film undergoes structural changes with increasing electron overall dose (e(-).A(-2)) rather than dose rate (e(-).A(-2).s(-1)), which suggests that overall dose is the key operative parameter. The electron beam-induced structural evolution of gamma-CsPbIBr2 is monitored by fine control of the electron beam dose, together with the analysis of high-resolution (S)TEM, diffraction, and energy-dispersive X-ray spectroscopy. Our results show that the gamma-CsPbIBr2 phase first forms an intermediate phase [e.g., CsPb(1-x)(IBr)((3-y))] with a superstructure of ordered vacancies in the pristine unit cell, while a fraction of Pb2+ is reduced to Pb-0. As the electron dose increases, Pb nanoparticles precipitate, while the remaining framework forms the Cs2IBr phase, accompanied by some amorphization. This work provides guidelines to minimize electron beam irradiation artifacts for atomic-resolution imaging on CsPbIBr2 thin films.

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作者机构:

  • [ 1 ] [Zhou, Xian-Gang]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 2 ] [Yang, Chen-Quan]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 3 ] [Sang, Xiahan]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 4 ] [Li, Wei]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 5 ] [Yin, Zhi-Wen]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 6 ] [Han, Jing-Ru]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 7 ] [Li, Yu]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 8 ] [Hu, Zhi-Yi]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 9 ] [Cheng, Yi-Bing]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 10 ] [Van Tendeloo, Gustaaf]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China
  • [ 11 ] [Zhou, Xian-Gang]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 12 ] [Yang, Chen-Quan]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 13 ] [Sang, Xiahan]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 14 ] [Yin, Zhi-Wen]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 15 ] [Han, Jing-Ru]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 16 ] [Hu, Zhi-Yi]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 17 ] [Van Tendeloo, Gustaaf]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China
  • [ 18 ] [Wang, Li]Mat Nova R&D Ctr, B-7000 Mons, Belgium
  • [ 19 ] [Ke, Xiaoxing]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Microstruct & Properties Solids, Beijing 100124, Peoples R China
  • [ 20 ] [Li, Wei]Foshan Xianhu Lab Adv Energy Sci & Technol Guangd, Foshan 528200, Peoples R China
  • [ 21 ] [Cheng, Yi-Bing]Foshan Xianhu Lab Adv Energy Sci & Technol Guangd, Foshan 528200, Peoples R China
  • [ 22 ] [Van Tendeloo, Gustaaf]Univ Antwerp, EMAT Electron Microscopy Mat Sci, B-2020 Antwerp, Belgium

通讯作者信息:

  • [Li, Wei]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China;;[Hu, Zhi-Yi]Wuhan Univ Technol, State Key Lab Adv Technol Mat Synth & Proc, Wuhan 430070, Peoples R China;;[Hu, Zhi-Yi]Wuhan Univ Technol, NRC Nanostruct Res Ctr, Wuhan 430070, Peoples R China;;[Li, Wei]Foshan Xianhu Lab Adv Energy Sci & Technol Guangd, Foshan 528200, Peoples R China

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来源 :

JOURNAL OF PHYSICAL CHEMISTRY C

ISSN: 1932-7447

年份: 2021

期: 19

卷: 125

页码: 10786-10794

3 . 7 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:72

JCR分区:2

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