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Author:

梅燕 (梅燕.)

Abstract:

1.化学机械抛光(CMP)简介2.CMP铈基抛光粉的制备及表征3.CMP铈基抛光液的组成及表征方法4.CMP铈基抛光粉/液的应用

Keyword:

制备及应用 抛光粉 CMP

Author Community:

  • [ 1 ] 北京工业大学材料与制造学部

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Source :

Year: 2021

Language: Chinese

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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