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作者:

Li, Songyu (Li, Songyu.) | Chen, Xiaoqing (Chen, Xiaoqing.) | Zhang, Zeyu (Zhang, Zeyu.) | Li, Xuhong (Li, Xuhong.) | Deng, Wenjie (Deng, Wenjie.) | Liu, Famin (Liu, Famin.) | Lu, Yue (Lu, Yue.) (学者:卢岳) | Zhang, Yongzhe (Zhang, Yongzhe.) (学者:张永哲)

收录:

SCIE

摘要:

2D-layered transition metal dichalcogenides (TMDCs) have attracted tremendous interest as candidate material for next-generation nanoelectronics because of their atomically layered lattices. However, their charge modulation based on chemical doping is commonly inefficient owing to the ultrathin crystal structures, which therefore limits their applications in electronic devices. Here, a photoinduced electrostatic modulation of WSe2 field-effect transistor with charge-trapping layers of hexagonal-BN (h-BN)/SiO2 is achieved for both n- and p-type polarities, which demonstrates a large on/off ratio exceeding 10(6). This electrostatic modulation of WSe2 performs a reversible and high carrier regulation from an electron density of 3 x 10(12) cm(-2) to a hole density of 1.5 x 10(12) cm(-2). Through this facile and powerful approach, a p-n homojunction rectifier and a complementary metal-oxide-semiconductor inverter are successfully prepared and perform the functions of AC-DC conversion and cascadable logic NOT. Consequently, these results provide a huge potential for wide applications of TMDC-based logic electronics.

关键词:

(2) complementary metal-oxide-semiconductor (CMOS) inverter photoinduced electrostatic modulation p-n homojunction rectifier WSe

作者机构:

  • [ 1 ] [Li, Songyu]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 2 ] [Li, Xuhong]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 3 ] [Liu, Famin]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 4 ] [Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 5 ] [Deng, Wenjie]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 6 ] [Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China
  • [ 7 ] [Zhang, Zeyu]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 8 ] [Lu, Yue]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China

通讯作者信息:

  • 张永哲

    [Chen, Xiaoqing]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China;;[Zhang, Yongzhe]Beijing Univ Technol, Fac Informat Technol, Key Lab Optoelect Technol, Educ Minist China, Beijing 100124, Peoples R China

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来源 :

ADVANCED ELECTRONIC MATERIALS

ISSN: 2199-160X

年份: 2021

6 . 2 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:8

被引次数:

WoS核心集被引频次: 3

SCOPUS被引频次: 5

ESI高被引论文在榜: 0 展开所有

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