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作者:

Li, Songyu (Li, Songyu.) | Zhang, Zeyu (Zhang, Zeyu.) | Chen, Xiaoqing (Chen, Xiaoqing.) | Deng, Wenjie (Deng, Wenjie.) | Lu, Yue (Lu, Yue.) (学者:卢岳) | Sui, Manling (Sui, Manling.) | Gong, Fan (Gong, Fan.) | Xu, Guoliang (Xu, Guoliang.) | Li, Xuhong (Li, Xuhong.) | Liu, Famin (Liu, Famin.) | You, Congya (You, Congya.) | Chu, Feihong (Chu, Feihong.) | Wu, Yi (Wu, Yi.) | Yan, Hui (Yan, Hui.) | Zhang, Yongzhe (Zhang, Yongzhe.)

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EI Scopus SCIE

摘要:

The emerging data-intensive applications in optoelectronics are driving innovation toward the fused integration of sensing, memory, and computing to break through the restrictions of the von Neumann architecture. However, the present photodetectors with only optoelectronic conversion functions cannot satisfy the growing demands of the multifunctions required in single devices. Here, a novel route for the integration of non-volatile memory into a photodetector is proposed, with a WSe2/h-BN van der Waals heterostructure on a Si/SiO2 substrate to realize in-memory photodetection. This photodetector exhibits an ultrahigh readout photocurrent of 3.4 mu A and photoresponsivity of 337.8 A W-1 in the solar-blind wavelength region, together with an extended retention time of more than 10 years. Furthermore, the charge-storage-based non-volatile mechanism of h-BN/SiO2 is successfully proven through a novel analysis of in situ optoelectronic electron energy-loss spectroscopy. These results represent a leap forward to future applications and insightful mechanisms of in-memory photodetection.

关键词:

non-volatile photodetection charge-storage effect 2D materials van der Waals heterostructures in-memory photodetectors

作者机构:

  • [ 1 ] [Li, Songyu]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Chen, Xiaoqing]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Deng, Wenjie]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Gong, Fan]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Li, Xuhong]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 6 ] [You, Congya]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Chu, Feihong]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Wu, Yi]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Zhang, Yongzhe]Beijing Univ Technol, Coll Microelect, Fac Informat Technol, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 10 ] [Li, Songyu]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 11 ] [Li, Xuhong]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 12 ] [Liu, Famin]Beihang Univ, Sch Phys, Beijing 100191, Peoples R China
  • [ 13 ] [Zhang, Zeyu]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 14 ] [Lu, Yue]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 15 ] [Sui, Manling]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 16 ] [Xu, Guoliang]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China
  • [ 17 ] [Yan, Hui]Beijing Univ Technol, Fac Mat & Mfg, Beijing 100124, Peoples R China

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来源 :

ADVANCED MATERIALS

ISSN: 0935-9648

年份: 2022

期: 10

卷: 34

2 9 . 4

JCR@2022

2 9 . 4 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:66

JCR分区:1

中科院分区:1

被引次数:

WoS核心集被引频次: 28

SCOPUS被引频次: 28

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 7

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