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Author:

Wang, Xiaolei (Wang, Xiaolei.) (Scholars:王晓蕾) | Cui, Shuainan (Cui, Shuainan.) | Yang, Qianqian (Yang, Qianqian.) | Ma, Lin (Ma, Lin.) | Xu, Jiao (Xu, Jiao.) | Xu, Guoliang (Xu, Guoliang.) | Shang, Zixuan (Shang, Zixuan.) | Liu, Danmin (Liu, Danmin.) | Zhao, Jinliang (Zhao, Jinliang.) | Deng, Jinxiang (Deng, Jinxiang.) | Zhai, Tianrui (Zhai, Tianrui.) | Hou, Zhipeng (Hou, Zhipeng.)

Indexed by:

EI Scopus SCIE

Abstract:

Mn3Ge, a typical member of the Heusler family, has a high spin polarization and large spin Hall angle, making it a potential material for spintronic devices. Regarded as a topological Weyl semi-metal, Mn3Ge could be applied in topological spintronics owing to its special Fermi-arc-type surface states and various spin transport properties. In this study, we grew high-quality perpendicularly magnetized Mn3Gefilms through magnetron sputtering. X-ray diffraction (XRD) showed that hexagonal antiferromagnetic Mn3Ge was mixed with tetragonal ferromagnetic Mn3Ge. Thickness-dependent double-phase Mn3Ge films with large magnetic anisotropy and robust anomalous Hall effect (AHE) were obtained. The triangular spin structure of hexagonal Mn3Ge enhances the AHE; however, it shrinks the coercivity of the tetragonal ferromagnetic property. This manipulation of coexisting multi-phases comes from the strain of the substrate during growth, achieved by controlling the film thickness. Structural, magnetic, and transport measurements demonstrated stress modulation of the defect pinning, magnetic anisot-ropy, and spin transport properties. The coexistence of antiferromagnetic and ferromagnetic Mn3Ge provides the possibility of a new generation of Mn3X-based devices for applications in spin-torque memories.

Keyword:

Spin -torque memories Anomalous Hall effect Strain of substrate Double -phase Mn 3 Ge Heusler alloy Magnetic anisotropy

Author Community:

  • [ 1 ] [Wang, Xiaolei]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 2 ] [Cui, Shuainan]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 3 ] [Yang, Qianqian]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 4 ] [Shang, Zixuan]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 5 ] [Zhao, Jinliang]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 6 ] [Deng, Jinxiang]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 7 ] [Zhai, Tianrui]Beijing Univ Technol, Fac Sci, Sch Phys & Optoelect, Beijing 100124, Peoples R China
  • [ 8 ] [Ma, Lin]Beijing Univ Technol, Fac Mat & Mfg, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 9 ] [Xu, Guoliang]Beijing Univ Technol, Fac Mat & Mfg, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 10 ] [Liu, Danmin]Beijing Univ Technol, Fac Mat & Mfg, Key Lab Adv Funct Mat, Minist Educ, Beijing 100124, Peoples R China
  • [ 11 ] [Hou, Zhipeng]South China Normal Univ, Guangdong Prov Key Lab Opt Informat Mat & Technol, South China Acad Adv Optoelect, Guangzhou 510006, Peoples R China

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Source :

APPLIED SURFACE SCIENCE

ISSN: 0169-4332

Year: 2022

Volume: 602

6 . 7

JCR@2022

6 . 7 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:66

JCR Journal Grade:1

CAS Journal Grade:2

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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