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作者:

Yang, Ying (Yang, Ying.) | Zhang, Yuelin (Zhang, Yuelin.) | Yang, Liang (Yang, Liang.) | Lu, Jingdi (Lu, Jingdi.) | Deng, Gongxun (Deng, Gongxun.) | Wang, Yinshu (Wang, Yinshu.) | Zhu, Hui (Zhu, Hui.) | Wang, Aiji (Wang, Aiji.)

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EI Scopus SCIE

摘要:

Resistive switching (RS) memristor has been widely used in the in-memory computation systems. Due to the strong information processing capability and low area cost of the ternary logic, the development of the three-state RS memristor was promoted. Here, we demonstrate a three-state RS phenomenon on Pt/BiFeO3/SrRuO3 structure. After applying a positive voltage to the thin film for a period, an abrupt RS effect occurs, where the three-state RS behavior can be obtained. By analyzing the conduction mechanisms of the current-voltage curves and the behavior of the capacitance-voltage curves, the three-state storage capability of the memristor can be ascribed to the movement of oxygen vacancies and the trapping/detrapping of charge carriers at the interface. The ternary OR logic gate was also designed with three steps by using only one memristor.

关键词:

electrical stressing ternary logic three-state resistive switching effect oxygen vacancy

作者机构:

  • [ 1 ] [Yang, Ying]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 2 ] [Zhang, Yuelin]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 3 ] [Yang, Liang]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 4 ] [Lu, Jingdi]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 5 ] [Deng, Gongxun]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 6 ] [Wang, Yinshu]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 7 ] [Wang, Aiji]Beijing Normal Univ, Dept Phys, Beijing 100875, Peoples R China
  • [ 8 ] [Zhang, Yuelin]Beihang Univ, Sch Integrated Circuit Sci & Engn, Fert Beijing Inst, MIIT Key Lab Spintron, Beijing 100191, Peoples R China
  • [ 9 ] [Lu, Jingdi]Univ Sci & Technol China, Hefei Natl Res Ctr Phys Sci Microscale, Hefei 230026, Peoples R China
  • [ 10 ] [Zhu, Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

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来源 :

PHYSICA SCRIPTA

ISSN: 0031-8949

年份: 2022

期: 11

卷: 97

2 . 9

JCR@2022

2 . 9 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:41

JCR分区:2

中科院分区:3

被引次数:

WoS核心集被引频次: 3

SCOPUS被引频次: 3

ESI高被引论文在榜: 0 展开所有

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