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作者:

Zhao, LiHuan (Zhao, LiHuan.) | Gao, ZhiYuan (Gao, ZhiYuan.) | Zhang, Jie (Zhang, Jie.) | Lu, LiWei (Lu, LiWei.) | Li, HongDa (Li, HongDa.)

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EI Scopus SCIE CSCD

摘要:

Fabrication temperature is an important factor affecting the manufacturability of electronic devices, especially for the bottom-up self-assembled nano-device. In this study, we used a lateral-bridged zinc oxide (ZnO) nanowire array UV sensor as a model to investigate the influence of temperature on device performance over the entire manufacturing process, from sensor fabrication to packaging. We found that annealing of the SiO2 substrate would make ZnO seed layer on top of it more compact and uniform, and hence improve the lateral orientation and uniformity of ZnO nanowires grown from the seed layer. With the annealed substrate, the light-to-dark current ratio increased by two orders of magnitude. On the contrary, annealing the ZnO seed layer would deteriorate the light-to-dark current ratio of the sensor, because annealing caused most of the grains in the seed layer to become vertically aligned, which in turn affected the lateral growth of ZnO nanowire arrays. During the packaging process, the surface structure of ZnO nanowires would change if the chip welded at a temperature of 230 degrees C for 2 min, resulting in a decrease of light-to-dark current ratio by three orders of magnitude.

关键词:

manufacturability UV sensor fabrication temperature nanowire ZnO

作者机构:

  • [ 1 ] [Zhao, LiHuan]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Gao, ZhiYuan]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Zhang, Jie]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Lu, LiWei]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Li, HongDa]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Zhao, LiHuan]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

通讯作者信息:

  • [Gao, ZhiYuan]Beijing Univ Technol, Microelect Sch, Key Lab Optoelect Technol, Beijing 100124, Peoples R China

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来源 :

SCIENCE CHINA-TECHNOLOGICAL SCIENCES

ISSN: 1674-7321

年份: 2020

期: 4

卷: 63

页码: 668-674

4 . 6 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:115

被引次数:

WoS核心集被引频次: 4

SCOPUS被引频次: 4

ESI高被引论文在榜: 0 展开所有

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