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作者:

Li, Yilin (Li, Yilin.) | Zhu, Hui (Zhu, Hui.) | Li, Rui (Li, Rui.) | Liu, Jie (Liu, Jie.) | Xiang, Jinjuan (Xiang, Jinjuan.) | Xie, Na (Xie, Na.) | Huang, Zeng (Huang, Zeng.) | Fang, Zhixuan (Fang, Zhixuan.) | Liu, Xing (Liu, Xing.) | Zhou, Lixing (Zhou, Lixing.)

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摘要:

We examined the wake-up effect in a TiN/Hf0.4Zr0.6O2/TiN structure. The increased polarization was affected by the cumulative duration of a switched electric field and the single application time of the field during each switching cycle. The space-charge-limited current was stable, indicating that the trap density did not change during the wake-up. The effective charge density in the space-charge region was extracted from capacitance-voltage curves, which demonstrated an increase in free charges at the interface. Based on changing characteristics in these properties, the wake-up effect can be attributed to the redistribution of oxygen vacancies under the electric field.

关键词:

cycling electric field wake up oxygen vacancy HZO ferroelectric thin-film

作者机构:

  • [ 1 ] [Li, Yilin]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 2 ] [Zhu, Hui]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 3 ] [Li, Rui]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 4 ] [Liu, Jie]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 5 ] [Xie, Na]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 6 ] [Huang, Zeng]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 7 ] [Fang, Zhixuan]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 8 ] [Liu, Xing]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 9 ] [Zhou, Lixing]Beijing Univ Technol, Fac Informat Technol, Beijing 100023, Peoples R China
  • [ 10 ] [Xiang, Jinjuan]Chinese Acad Sci, Inst Microelect, Beijing 100029, Peoples R China

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来源 :

CHINESE PHYSICS B

ISSN: 1674-1056

年份: 2022

期: 8

卷: 31

1 . 7

JCR@2022

1 . 7 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:41

JCR分区:3

中科院分区:3

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