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Author:

Huang, Yuling (Huang, Yuling.) | Zhang, Bin (Zhang, Bin.) | Li, Jingwei (Li, Jingwei.) | Zhou, Zizhen (Zhou, Zizhen.) | Zheng, Sikang (Zheng, Sikang.) | Li, Nanhai (Li, Nanhai.) | Wang, Guiwen (Wang, Guiwen.) | Zhang, De (Zhang, De.) | Zhang, Daliang (Zhang, Daliang.) | Han, Guang (Han, Guang.) | Wang, Guoyu (Wang, Guoyu.) | Han, Xiaodong (Han, Xiaodong.) | Lu, Xu (Lu, Xu.) | Zhou, Xiaoyuan (Zhou, Xiaoyuan.)

Indexed by:

EI Scopus SCIE

Abstract:

Thermoelectric materials are typically highly degenerate semiconductors, which require high carrier concentration. However, the efficiency of conventional doping by replacing host atoms with alien ones is restricted by solubility limit, and, more unfavorably, such a doping method is likely to cause strong charge-carrier scattering at ambient temperature, leading to deteriorated electrical performance. Here, an unconventional doping strategy is proposed, where a small trace of alien atoms is used to stabilize cation vacancies in Cu3SbSe4 by compositing with CuAlSe2, in which the cation vacancies rather than the alien atoms provide a high density of holes. Consequently, the hole concentration enlarges by six times but the carrier mobility is well maintained. As a result, a record-high average power factor of 19 mu W cm(-1) K-2 in the temperature range of 300-723 K is attained. Finally, with further reduced lattice thermal conductivity, a peak zT value of 1.4 and a record-high average zT value of 0.72 are achieved within the diamond-like compounds. This new doping strategy not only can be applied for boosting the average power factor for thermoelectrics, but more generally can be used to maintain carrier mobility for a variety of semiconductors that need high carrier concentration.

Keyword:

carrier mobility unconventional doping chalcopyrites high power factor thermoelectrics

Author Community:

  • [ 1 ] [Huang, Yuling]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 2 ] [Zhou, Zizhen]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 3 ] [Zheng, Sikang]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 4 ] [Li, Nanhai]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 5 ] [Zhang, De]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 6 ] [Lu, Xu]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 7 ] [Zhou, Xiaoyuan]Chongqing Univ, Coll Phys, Chongqing 401331, Peoples R China
  • [ 8 ] [Zhang, Bin]Chongqing Univ, Analyt & Testing Ctr, Chongqing 401331, Peoples R China
  • [ 9 ] [Wang, Guiwen]Chongqing Univ, Analyt & Testing Ctr, Chongqing 401331, Peoples R China
  • [ 10 ] [Zhou, Xiaoyuan]Chongqing Univ, Analyt & Testing Ctr, Chongqing 401331, Peoples R China
  • [ 11 ] [Li, Jingwei]Chongqing Univ, Multiscale Porous Mat Ctr, Inst Adv Interdisciplinary Studies, Chongqing 401331, Peoples R China
  • [ 12 ] [Zhang, Daliang]Chongqing Univ, Multiscale Porous Mat Ctr, Inst Adv Interdisciplinary Studies, Chongqing 401331, Peoples R China
  • [ 13 ] [Li, Jingwei]Chongqing Univ, Sch Chem & Chem Engn, Chongqing 401331, Peoples R China
  • [ 14 ] [Zhang, Daliang]Chongqing Univ, Sch Chem & Chem Engn, Chongqing 401331, Peoples R China
  • [ 15 ] [Zhou, Zizhen]Chongqing Univ, Ctr Quantum Mat & Devices, Chongqing 401331, Peoples R China
  • [ 16 ] [Lu, Xu]Chongqing Univ, Ctr Quantum Mat & Devices, Chongqing 401331, Peoples R China
  • [ 17 ] [Zhou, Xiaoyuan]Chongqing Univ, Ctr Quantum Mat & Devices, Chongqing 401331, Peoples R China
  • [ 18 ] [Han, Guang]Chongqing Univ, Coll Mat Sci & Engn, Chongqing 400044, Peoples R China
  • [ 19 ] [Wang, Guoyu]Chinese Acad Sci, Chongqing Inst Green & Intelligent Technol, Chongqing 400714, Peoples R China
  • [ 20 ] [Han, Xiaodong]Beijing Univ Technol, Beijing Key Lab Microstruct & Property Adv Mat, Beijing 100024, Peoples R China

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Source :

ADVANCED MATERIALS

ISSN: 0935-9648

Year: 2022

Issue: 14

Volume: 34

2 9 . 4

JCR@2022

2 9 . 4 0 0

JCR@2022

ESI Discipline: MATERIALS SCIENCE;

ESI HC Threshold:66

JCR Journal Grade:1

CAS Journal Grade:1

Cited Count:

WoS CC Cited Count: 49

SCOPUS Cited Count: 59

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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