Through　Silicon　Via　copper　(TSV-Cu)　is　the　crucial　element　for　chips　stacking　and　3D　packaging　vertically.　During　the　TSV-Cu　manufacturing,　annealing　process　is　essential　to　relive　the　residual　stress　inner　the　TSV-Cu　and　stabilize　the　microstructure　of　Cu　grain.　However,　the　annealing　process　usually　leads　to　TSV-Cu　protrusions,　which　have　to　be　flattened　by　chemical　mechanical　polishing　(CMP)　to　perform　subsequent　process.　Subsequent　process　concerned　with　high　temperature　treatments　will　continue　to　result　in　a　second　protrusion　of　TSV-Cu,　which　threatens　the　reliability　of　interconnect　structures　above　the　TSV.　In　this　paper,　the　effects　of　various　annealing　heating　rates　on　protrusions　of　TSV-Cu　and　its　microstructure　evolution　are　investigated.　The　influences　of　grain　size　and　grain　boundary　types　for　TSV-Cu　under　various　heating　rates　on　protrusions　are　analyzed　and　discussed.　©　2022　IEEE.