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Author:

Zhang, Meng (Zhang, Meng.) | Zhang, Yamin (Zhang, Yamin.) | Li, Baikui (Li, Baikui.) | Feng, Shiwei (Feng, Shiwei.) | Hua, Mengyuan (Hua, Mengyuan.) | Tang, Xi (Tang, Xi.) | Wei, Jin (Wei, Jin.) | Chen, Kevin J. (Chen, Kevin J..)

Indexed by:

EI Scopus SCIE

Abstract:

In silicon carbide (SiC) planar insulated-gate bipolar transistor (IGBT), a large distance between neighboring p-bodies is beneficial to enhance the on-state conductivity modulation, but will expose the gate oxide to high electric field in off-state. With p-bodies placed closer, the gate oxide field is reduced, but the conductivity modulation is suppressed. In this work, a new SiC planar IGBT with oxide shield is proposed and studied by TCAD simulations. The proposed SiC IGBT achieves improved trade-off between on-state voltage drop (V-ON) and maximum gate oxide electric field (Eox-m). When a quite larger distance between neighboring p-bodies is adopted in the proposed SiC IGBT, a low VON is obtained, while the Eox-m can be kept at a small value with the oxide shielding structures protecting the gate oxide. Switching characteristics are also studied, and the proposed SiC-IGBT delivers much better trade-off between turn-off energy loss (E-OFF) and VON than the conventional SiC planar IGBT.

Keyword:

SiC IGBT maximum gate oxide electric field oxide shield on-state voltage drop Insulated gate bipolar transistors Logic gates Conductivity JFETs Modulation turn-off energy loss Silicon carbide Electric fields

Author Community:

  • [ 1 ] [Zhang, Meng]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 2 ] [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 3 ] [Feng, Shiwei]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China
  • [ 4 ] [Li, Baikui]Shenzhen Univ, Coll Phys & Optoelect Engn, State Key Lab Radio Frequency Heterogeneous Integ, Shenzhen 518060, Peoples R China
  • [ 5 ] [Hua, Mengyuan]Southern Univ Sci & Technol, Dept Elect & Elect Engn, Shenzhen 518060, Peoples R China
  • [ 6 ] [Tang, Xi]Anhui Univ, Inst Phys Sci & Informat Technol, Hefei 230601, Peoples R China
  • [ 7 ] [Tang, Xi]Anhui Univ, Sch Elect Engn & Automat, Hefei 230601, Peoples R China
  • [ 8 ] [Wei, Jin]Peking Univ, Inst Microelect, Beijing 100871, Peoples R China
  • [ 9 ] [Chen, Kevin J.]Hong Kong Univ Sci & Technol, Dept Elect & Comp Engn, Hong Kong, Peoples R China

Reprint Author's Address:

  • [Zhang, Yamin]Beijing Univ Technol, Coll Microelect, Beijing 100124, Peoples R China;;[Li, Baikui]Shenzhen Univ, Coll Phys & Optoelect Engn, State Key Lab Radio Frequency Heterogeneous Integ, Shenzhen 518060, Peoples R China;;[Wei, Jin]Peking Univ, Inst Microelect, Beijing 100871, Peoples R China;;

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Source :

IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY

ISSN: 2168-6734

Year: 2023

Volume: 11

Page: 198-203

2 . 3 0 0

JCR@2022

Cited Count:

WoS CC Cited Count:

SCOPUS Cited Count:

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 0

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