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作者:

Wang, Long (Wang, Long.) | Hou, Chuantao (Hou, Chuantao.) | Zheng, Junxing (Zheng, Junxing.) | Cao, Peng (Cao, Peng.) | Wang, Jianru (Wang, Jianru.)

收录:

EI Scopus SCIE

摘要:

The coplanarity of BGA (Ball Grid Array) solder balls is critical for reliable connectivity in semi-conductor units. However, existing ball height inspection techniques require high-cost equipment and skilled operators, which are not feasible for using in real-time manufacturing process. In this paper, a fast measurement method of copla-narity inspection of solder balls is developed based on structured light technique. The hardware of the system includes a camera and a projector. The digital-light-processing (DLP) projector emits programmed image pat-terns and the digital complementary-metal-oxide-semiconductor (CMOS) camera captures distorted image pat-terns on solder balls. The image processing software is developed to compare the original and distorted image patterns to reconstruct the three-dimensional (3D) solder balls. The method has been calibrated extensively and exhibits accuracy within 5 mu m mean squared error compared to ground truth values determined by X-ray computed tomography. The proposed method achieves reliable, in-line ball height measurement and could be potentially used for real-time in-line coplanarity inspection of BGA chip during manufacturing.

关键词:

Ball Grid Array Structured light Coplanarity inspection

作者机构:

  • [ 1 ] [Cao, Peng]Beijing Univ Technol, Fac Architecture Civil & Transportat Engn, Beijing 100084, Peoples R China
  • [ 2 ] [Wang, Long]Beijing Inst Struct & Environm Engn, Sci & Technol Reliabil & Environm Engn Lab, Beijing 100076, Peoples R China
  • [ 3 ] [Hou, Chuantao]Beijing Inst Struct & Environm Engn, Sci & Technol Reliabil & Environm Engn Lab, Beijing 100076, Peoples R China
  • [ 4 ] [Zheng, Junxing]Huazhong Univ Sci & Technol, Sch Civil & Hydraul Engn, Wuhan 430074, Hubei, Peoples R China
  • [ 5 ] [Wang, Jianru]41st Inst Fourth Res Acad CASC, Xian 100124, Peoples R China

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来源 :

MICROELECTRONICS JOURNAL

ISSN: 0026-2692

年份: 2023

卷: 137

2 . 2 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:19

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SCOPUS被引频次: 6

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