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作者:

Pan, Shijie (Pan, Shijie.) | Zhou, Lixing (Zhou, Lixing.) | You, Binyu (You, Binyu.) | Bai, Kun (Bai, Kun.) | Lu, Xiaozhuang (Lu, Xiaozhuang.)

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摘要:

In this work, we presented a comprehensive investigation of the trapping effect in the GaN-based high-electron-mobility transistors (HEMTs) under the negative gate-source voltage condition. The trapping mechanisms in the OFF state were analyzed and the trapping behaviors were characterized using the pulsed measurements preliminarily. Specifically, the transient drain-source voltage curves under a certain filling condition were monitored to reflect the trapping effect in the OFF state. The spectra of time constant and differential amplitude were combined to obtain the information on traps. Three traps with activation energys of 0.467, 0.552, and 0.067 eV were characterized using the transient drain voltage curves under different temperatures. The trap characterization methods may be useful for the further study of the trapping behaviors and can be helpful for the improvement of the reliability of the devices. © Published under licence by IOP Publishing Ltd.

关键词:

Gallium nitride High electron mobility transistors Electron mobility Transients III-V semiconductors Activation energy

作者机构:

  • [ 1 ] [Pan, Shijie]Faculty of Information Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Zhou, Lixing]Faculty of Information Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [You, Binyu]Faculty of Information Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 4 ] [Bai, Kun]Faculty of Information Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China
  • [ 5 ] [Lu, Xiaozhuang]Faculty of Information Technology, College of Microelectronics, Beijing University of Technology, Beijing; 100124, China

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ISSN: 1742-6588

年份: 2023

期: 1

卷: 2524

语种: 英文

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