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作者:

Xie, Lilin (Xie, Lilin.) | Lu, Hui (Lu, Hui.) | Jiao, Yilin (Jiao, Yilin.) | Qiao, Shihang (Qiao, Shihang.) | Zheng, Yisheng (Zheng, Yisheng.) | Li, Ang (Li, Ang.) | Chen, Yanhui (Chen, Yanhui.) | Han, Xiaodong (Han, Xiaodong.) (学者:韩晓东)

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EI Scopus SCIE

摘要:

Investigating the diffusion behavior of binary system is crucial for understanding the solid-state diffusion in metallic joints, as it affects the interfacial reaction that forms intermetallic components (IMCs) and introduces Kirkendall voids that change the interfacial microstructures. In this study, we intuitively investigated the interfacial diffusion behavior of Copper-Zinc alloy binary interface by in situ transmission electron microscopy. Our findings revealed the interfacial diffusion of atoms, the growth processes of intermetallic phases, and the evolution of the Kirkendall voids during thermal diffusion. We observed that the Zn atoms diffuse rapidly into Cu and form the 13 phase at the onset of thermal diffusion at 200 & DEG;C. Additionally, with increasing temperature, Cu atoms control the diffusion and the formation of IMCs due to their higher diffusion coefficient in the 13 and & alpha; phases, which are 2.09 & PLUSMN; 0.63 x 10-16 m2/s at 250 & DEG;C and 3.44 & PLUSMN; 0.44 x 10-17 m2/s at 300 & DEG;C, respectively. Furthermore, we found that the interface significantly influences the interdiffusion rates of the IMCs and the formation of Kirkendall voids. The emergence of voids, which are formed at the initial defective site and the IMC layer at the temperature of 250 and 300 & DEG;C, respectively, leading to a considerable decrease in interdiffusion at the binary interface of two orders of magnitude in comparison to unaffected regions. Moreover, we revealed the evolution of Kirkendall void, involving the formation and merging of holes, as well as the gradual thinning of atomic layers during diffusion. These findings are essential for understanding the formation and evolution of IMCs and Kirkendall void in binary interfaces.

关键词:

Intermetallic components Cu-Zn alloy interface Kirkendall void Interfacial diffusion In situ transmission electron microscopy

作者机构:

  • [ 1 ] [Xie, Lilin]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 2 ] [Lu, Hui]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 3 ] [Jiao, Yilin]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 4 ] [Qiao, Shihang]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 5 ] [Zheng, Yisheng]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 6 ] [Li, Ang]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 7 ] [Chen, Yanhui]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China
  • [ 8 ] [Han, Xiaodong]Beijing Univ Technol, Inst Microstruct & Property Adv Mat, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF ALLOYS AND COMPOUNDS

ISSN: 0925-8388

年份: 2023

卷: 968

6 . 2 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:26

被引次数:

WoS核心集被引频次:

SCOPUS被引频次: 15

ESI高被引论文在榜: 0 展开所有

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