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作者:

Selvakumar, Karuppaiah (Selvakumar, Karuppaiah.) | Oh, Tae Hwan (Oh, Tae Hwan.) | Wang, Yueshuai (Wang, Yueshuai.) | Sadhasivam, Thangarasu (Sadhasivam, Thangarasu.) | Sadhasivam, Subramani (Sadhasivam, Subramani.) | Swaminathan, Meenakshisundaram (Swaminathan, Meenakshisundaram.)

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EI Scopus SCIE

摘要:

Herein, we fabricated a single metal atom oxide (W, Cu and Co) anchored on the interstitials atomic line of BiVO4 with reduced graphene oxide (rGO-ED-BiVO4-WCuCo) by simple sonication process, which demonstrated a good photocatalytic degradation of organic contaminants. Through examination of the physical and chemical characteristics of the prepared material discovered that the higher density loading of single metal atom oxide (SMAO) uniformly on interstitials atomic line of BiVO4 improved its ability to absorb visible light. The photocatalytic efficiency of nanocomposites has been evaluated in the presence of visible light using the model chemicals norfloxacin (NF) and rhodamine B (RB). Comparison of pristine heteropoly acid, BiVO4, and nanocomposites rGO-ED-BiVO4-WCo-30, rGO-ED-BiVO4-WCu-30 and rGO-ED-BiVO4-WCuCo-20, demonstrated that employing rGO-ED-BiVO4-WCuCo-30 increased the degradation efficiency of NF and RB to 95.6% and 97.8%, proving that W/Cu/Co deposition is a useful method for boosting BiVO4's photocatalytic activity. The enhanced electron transfer capacity may be attributed in large part to the incorporation of W, Cu, and Co oxide, which acts as a potent electron driving force. After five cycles of reusing rGO-ED-BiVO4-WCuCo-30, a slight decrease in the degradation efficiency was noticed. LC-MS identified the generation of possible intermediates along the norfloxacin degradation pathway. Overall, a simple technique to synthesize SMAO catalysts for the visible light mediated heterogeneous photocatalytic degradation of pharmaceutical and dye contaminants is reported.

关键词:

Sonication Single metal atom oxide Norfloxacin Photocatalysts Dye

作者机构:

  • [ 1 ] [Selvakumar, Karuppaiah]Yeungnam Univ, Sch Chem Engn, Gyeongbuk 38541, South Korea
  • [ 2 ] [Oh, Tae Hwan]Yeungnam Univ, Sch Chem Engn, Gyeongbuk 38541, South Korea
  • [ 3 ] [Sadhasivam, Thangarasu]Yeungnam Univ, Sch Chem Engn, Gyeongbuk 38541, South Korea
  • [ 4 ] [Sadhasivam, Subramani]Yeungnam Univ, Sch Chem Engn, Gyeongbuk 38541, South Korea
  • [ 5 ] [Wang, Yueshuai]Beijing Univ Technol, Fac Mat & Mfg, Inst Microstruct & Properties Adv Mat, Beijing 100124, Peoples R China
  • [ 6 ] [Swaminathan, Meenakshisundaram]Kalasalingam Acad Res & Educ, Dept Chem, Nanomat Lab, Krishnankoil 626126, India

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来源 :

JOURNAL OF CLEANER PRODUCTION

ISSN: 0959-6526

年份: 2023

卷: 423

1 1 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:19

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SCOPUS被引频次: 17

ESI高被引论文在榜: 0 展开所有

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