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作者:

Tian, Huijun (Tian, Huijun.) | Hu, Anqi (Hu, Anqi.) | Liu, Qiaoli (Liu, Qiaoli.) | He, Xiaoying (He, Xiaoying.) | Guo, Xia (Guo, Xia.) (学者:郭霞)

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EI SCIE

摘要:

Photodetectors based on two-dimensional (2D)/ three-dimensional (3D) semiconductor heterojunction structures are emerging as appealing candidates for high-sensitivity applications. The performances of these hybrid photodetectors are closely correlated with their current gain mechanism. Carrier recirculation is the most commonly reported mechanism. Recently, a Fermi level alignment mechanism was proposed for 2D graphene/0-dimensional (0D) quantum dot heterostructures because of the easy Fermi level tunability of the quantum dot. In this article, an interface-induced gain mechanism using this Fermi level alignment process is proposed and identified based on a 2D graphene/3D GaAs hybrid structure with comparative measurement configurations. Because of the high surface state density of GaAs, the photo-excited holes tend to become trapped at the graphene/GaAs interface, which can easily lower the interface Fermi level and the Fermi level in graphene via an alignment process. When combined with the high carrier mobility characteristics of graphene, a maximum current gain of 2520 and responsivity of 1321 A W-1 are achieved in the devices. This study clarifies the role of the interface states in the gain characteristics of some 2D/3D hybrid devices, with results that are instructive for optimal device design.

关键词:

GaAs graphene interface-induced gain photodetectors responsivity

作者机构:

  • [ 1 ] [Tian, Huijun]Beijing Univ Posts & Telecommun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
  • [ 2 ] [Hu, Anqi]Beijing Univ Posts & Telecommun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
  • [ 3 ] [He, Xiaoying]Beijing Univ Posts & Telecommun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
  • [ 4 ] [Guo, Xia]Beijing Univ Posts & Telecommun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China
  • [ 5 ] [Tian, Huijun]Beijing Univ Technol, Inst Laser Engn, Beijing 100124, Peoples R China
  • [ 6 ] [Liu, Qiaoli]Beijing Univ Technol, Sch Informat, Beijing 100124, Peoples R China

通讯作者信息:

  • 郭霞

    [Guo, Xia]Beijing Univ Posts & Telecommun, Sch Elect Engn, Beijing Key Lab Work Safety Intelligent Monitorin, State Key Lab Informat Photon & Opt Commun, Beijing 100876, Peoples R China

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来源 :

ADVANCED OPTICAL MATERIALS

ISSN: 2195-1071

年份: 2020

期: 8

卷: 8

9 . 0 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:37

JCR分区:1

被引次数:

WoS核心集被引频次: 38

SCOPUS被引频次: 39

ESI高被引论文在榜: 0 展开所有

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