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Author:

Assali, Simone (Assali, Simone.) | Bergamaschini, Roberto (Bergamaschini, Roberto.) | Scalise, Emilio (Scalise, Emilio.) | Verheijen, Marcel A. (Verheijen, Marcel A..) | Albani, Marco (Albani, Marco.) | Dijkstra, Alain (Dijkstra, Alain.) | Li, Ang (Li, Ang.) (Scholars:李昂) | Koelling, Sebastian (Koelling, Sebastian.) | Bakkers, Erik P. A. M. (Bakkers, Erik P. A. M..) | Montalenti, Francesco (Montalenti, Francesco.) | Miglio, Leo (Miglio, Leo.)

Indexed by:

EI Scopus SCIE PubMed

Abstract:

The growth of Sn-rich group-IV semiconductors at the nanoscale can enrich the understanding of the fundamental properties of metastable GeSn alloys. Here, we demonstrate the effect of the growth conditions on the morphology and composition of Ge/GeSn core/shell nanowires by correlating the experimental observations with a theoretical interpretation based on a multiscale approach. We show that the cross-sectional morphology of Ge/GeSn core/shell nanowires changes from hexagonal to dodecagonal upon increasing the supply of the Sn precursor. This transformation strongly influences the Sn distribution as a higher Sn content is measured under the {112} growth front. Ab initio DFT calculations provide an atomic-scale explanation by showing that Sn incorporation is favored at the {112} surfaces, where the Ge bonds are tensile-strained. A phase-field continuum model was developed to reproduce the morphological transformation and the Sn distribution within the wire, shedding light on the complex growth mechanism and unveiling the relation between segregation and faceting. The tunability of the photoluminescence emission with the change in composition and morphology of the GeSn shell highlights the potential of the core/shell nanowire system for optoelectronic devices operating at mid-infrared wavelengths.

Keyword:

segregation germanium tin heterostructure photoluminescence first-principles calculations kinetic growth model semiconductor nanowire

Author Community:

  • [ 1 ] [Assali, Simone]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
  • [ 2 ] [Dijkstra, Alain]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
  • [ 3 ] [Li, Ang]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
  • [ 4 ] [Koelling, Sebastian]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
  • [ 5 ] [Bakkers, Erik P. A. M.]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands
  • [ 6 ] [Assali, Simone]Ecole Polytech Montreal, Dept Engn Phys, Montreal, PQ H3C 3A7, Canada
  • [ 7 ] [Bergamaschini, Roberto]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy
  • [ 8 ] [Scalise, Emilio]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy
  • [ 9 ] [Albani, Marco]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy
  • [ 10 ] [Montalenti, Francesco]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy
  • [ 11 ] [Miglio, Leo]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy
  • [ 12 ] [Bergamaschini, Roberto]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
  • [ 13 ] [Scalise, Emilio]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
  • [ 14 ] [Albani, Marco]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
  • [ 15 ] [Montalenti, Francesco]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
  • [ 16 ] [Miglio, Leo]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy
  • [ 17 ] [Verheijen, Marcel A.]Eurofins Mat Sci BV, NL-5656 AE Eindhoven, Netherlands
  • [ 18 ] [Li, Ang]Beijing Univ Technol, Beijing 100124, Peoples R China
  • [ 19 ] [Bakkers, Erik P. A. M.]Delft Univ Technol, Kavli Inst Nanosci, NL-2600 GA Delft, Netherlands

Reprint Author's Address:

  • [Assali, Simone]Eindhoven Univ Technol, Dept Appl Phys, NL-5600 MB Eindhoven, Netherlands;;[Assali, Simone]Ecole Polytech Montreal, Dept Engn Phys, Montreal, PQ H3C 3A7, Canada;;[Bergamaschini, Roberto]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy;;[Scalise, Emilio]Univ Milano Bicocca, L NESS, I-20125 Milan, Italy;;[Bergamaschini, Roberto]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy;;[Scalise, Emilio]Univ Milano Bicocca, Dept Mat Sci, I-20125 Milan, Italy

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Source :

ACS NANO

ISSN: 1936-0851

Year: 2020

Issue: 2

Volume: 14

Page: 2445-2455

1 7 . 1 0 0

JCR@2022

ESI Discipline: CHEMISTRY;

ESI HC Threshold:139

Cited Count:

WoS CC Cited Count: 19

SCOPUS Cited Count: 21

ESI Highly Cited Papers on the List: 0 Unfold All

WanFang Cited Count:

Chinese Cited Count:

30 Days PV: 1

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