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作者:

Zhou, Xintian (Zhou, Xintian.) | Pang, Haoyang (Pang, Haoyang.) | Jia, Yunpeng (Jia, Yunpeng.) | Hu, Dongqing (Hu, Dongqing.) | Wu, Yu (Wu, Yu.) | Tang, Yun (Tang, Yun.) | Xia, Tian (Xia, Tian.) | Gong, Hao (Gong, Hao.) | Zhao, Yuanfu (Zhao, Yuanfu.)

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EI SCIE

摘要:

A novel SiC double-trench MOSFET (DT-MOS) with embedded MOS-channel diode is proposed and investigated via TCAD simulations in this article. The parasitic body diode is free from activation when the device serves as a freewheeling diode, thus completely eliminating the bipolar degradation. Moreover, the proposed MOSFET features superior dynamic characteristics. The gate charge and gate-to-drain charge are reduced by a factor of 3.9, respectively, when compared to the conventional state-of-the-art SiC DT-MOS. Combined with the slightly increased ON-resistance remarkably improved figures of merit are reduced by a factor of 3.7, respectively are obtained in the proposed structure. When working as a switching device under 200 kHz, the proposed MOSFET could save nearly of the total power losses, making it more conductive to high-frequency applications. In addition, the influence of parameters variation on the device performance is discussed as well.

关键词:

Bipolar degradation high-frequency applications MOS-channel diode SiC double-trench MOSFET (SiC DT-MOS)

作者机构:

  • [ 1 ] [Zhou, Xintian]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 2 ] [Pang, Haoyang]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 3 ] [Jia, Yunpeng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 4 ] [Hu, Dongqing]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 5 ] [Wu, Yu]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 6 ] [Tang, Yun]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 7 ] [Xia, Tian]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 8 ] [Gong, Hao]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China
  • [ 9 ] [Zhao, Yuanfu]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

通讯作者信息:

  • [Jia, Yunpeng]Beijing Univ Technol, Fac Informat Technol, Beijing 100124, Peoples R China

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来源 :

IEEE TRANSACTIONS ON ELECTRON DEVICES

ISSN: 0018-9383

年份: 2020

期: 2

卷: 67

页码: 582-587

3 . 1 0 0

JCR@2022

ESI学科: ENGINEERING;

ESI高被引阀值:28

JCR分区:2

被引次数:

WoS核心集被引频次: 35

SCOPUS被引频次: 26

ESI高被引论文在榜: 0 展开所有

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中文被引频次:

近30日浏览量: 2

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