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Using block copolymer architecture to achieve sub-10 nm periods
Using salt-doped polystyrene-b-poly(2-vinylpyridin
文献获取Using block copolymer architecture to achieve Sub-10 nm periods
Using salt-doped polystyrene- b -poly(2-vinylpyridine) star shaped block copolymer as a model, we show that the architecture of (A- b -B) n type multi-...
Using block copolymer architecture to achieve sub-10?nm periods
B.; Russell, T. P. Using Block Copolymer Architecture to Achieve Sub-10 nm Periods. Polymer 2017, 121, 297-303.
Using block copolymer architecture to achieve sub-10 nm periods
Using salt-doped polystyrene-b-poly(2-vinylpyridin
Assembly of Sub-10-nm Block Copolymer Patterns with Mixed Morphology and Period Using Electron Irradiation and Solvent Annealing
Block copolymer self-assembly generates patterns with periodicity in the 10-100 nm range and is increasingly recognized as a route to lithographic patte...
Sub-10-nm planar-bulk-CMOS devices using lateral junction control
Sub-10-nm planar-bulk-CMOS devices were clearly demonstrated by a lateral source/drain (S/D) junction control using the precisely-controlled gate-electr...
Sub-10 nm feature size PS-b-PDMS block copolymer structures fabricated by a microwave-assisted solvothermal process.
Block copolymer (BCP) microphase separation at surfaces might enable the generation of substrate features in a scalable, manufacturable, bottom-up fashi...
Development of sub-10-nm atomic layer deposition barriers for Cu/low-k interconnects
The development of atomic layer deposition (ALD) barriers with a thickness below 10 nm for copper/low- k dielectric interconnects was reviewed. The CMOS...
Assembly of sub-10
Block copolymer self-assembly generates patterns with periodicity in the 鈭 10-100 nm range and is increasingly recognized as a route to lithographic pa...
Resist Free Patterning of Nonpreferential Buffer Layers for Block Copolymer Lithography
We report the design of a direct electron beam patternable buffer layer to spatially control the orientation of the microdomains in an overlaying polyst...
