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作者:

Wang, Yan (Wang, Yan.) | Wang, Yishu (Wang, Yishu.) | Ma, Limin (Ma, Limin.) | Han, Jing (Han, Jing.) | Guo, Fu (Guo, Fu.) (学者:郭福)

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EI Scopus SCIE

摘要:

Because of its tetragonal structure, beta-Sn exhibits anisotropy in electromigration behavior. The diffusivity of Cu atoms along the c-axis of Sn is much faster than that along the a-axis; therefore, the orientation of the c-axis exerts a strong influence on Cu atomic motion. In this work, the effect of Sn grain c-axis on Cu atomic motion was investigated by using Cu reinforced Sn3.5Ag composite solder joints. The microstructure and morphology of the solder joints were characterized by scanning electron microscopy (SEM) equipped with a backscattered electron (BSE) detector. It was found that intermetallic compounds (IMCs) in the solder matrix were formed due to the migration of Cu atoms to the surface of the solder joint under current stressing. There was a large amount of IMCs on the solder matrix which protruded from the solder matrix. By changing the direction of electron flow, i.e. changing the anode and the cathode side, the IMCs which formed after current stressing in the solder matrix disappeared and the protruding Sn remained unchanged. The results revealed that the growth of IMCs was closely related to the migration of Cu atoms, while Cu atomic motion depended on the orientation of the Sn grain c-axis.

关键词:

composite solder Cu atomic motion electromigration intermetallic compound growth Sn grain c-axis

作者机构:

  • [ 1 ] [Wang, Yan]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 2 ] [Wang, Yishu]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 3 ] [Ma, Limin]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 4 ] [Han, Jing]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China
  • [ 5 ] [Guo, Fu]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

通讯作者信息:

  • 郭福

    [Guo, Fu]Beijing Univ Technol, Coll Mat Sci & Engn, Beijing 100124, Peoples R China

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来源 :

JOURNAL OF ELECTRONIC MATERIALS

ISSN: 0361-5235

年份: 2020

期: 3

卷: 49

页码: 2159-2163

2 . 1 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:37

JCR分区:3

被引次数:

WoS核心集被引频次: 6

SCOPUS被引频次: 4

ESI高被引论文在榜: 0 展开所有

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