For　the　very　narrow　ridge　waveguide　width,　the　etching　marks　and　etching　methods　in　the　manufacturing　of　the　semiconductor　tapered　laser　chip　were　studied　in　this　paper.　The　double　photolithography　alignment　mark　using　two　different　precisions　for　the　ridge　area　and　the　tapered　area　was　proposed　to　refine　the　alignment　in　the　etching　of　ridge　waveguide　and　tapered　waveguide.　The　photolithography　alignment　marks　were　arranged　in　different　place　in　different　photolithography　figure,　and　they　interacted　each　other　in　order　to　keep　the　photolithography　alignment　marks　clear　and　complete　in　repeated　etching.　By　using　this　method,　the　etched　chip　delivers　4.026　W　CW　output　at　7　A　current　with　the　center　wavelength　of　963　nm,　and　the　slow　and　fast　direction　beam　quality　is　1.593　mm·mrad　and　0.668　mm·mrad,　respectively.　©　2016,　Science　Press.　All　right　reserved.