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作者:

Shi, Lei (Shi, Lei.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Liu, Kun (Liu, Kun.) | Zhang, Yamin (Zhang, Yamin.)

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摘要:

The phenomenon of self-changing on the device parameters and characteristics after a step voltage stress was applied to the gate is studied in AlGaN/GaN high electron mobility transistors. The device was measured every 5 min after the stress was removed. The large-signal parasitic source (drain) resistance, transfer characteristics, threshold voltage, drain-source current, gate-source (drain) reverse current-voltage characteristics changed spontaneously after the removal of the stress. The time constant of the self-changing was about 25-27 min. The gate-source (drain) capacitance-voltage characteristics were constant during this process. Electrons were trapped by the surface states and traps in the AlGaN barrier layer when the device was under stress. The traps in the AlGaN barrier layer then released electrons in less than 10 s. The surface states released electrons continuously during the entire measurement stage, leading to the self-changing of mearsurement result. © 2015 Chinese Institute of Electronics.

关键词:

Current voltage characteristics Drain current Electron mobility Electrons Gallium nitride High electron mobility transistors MESFET devices Stresses Surface states Threshold voltage Voltage distribution measurement

作者机构:

  • [ 1 ] [Shi, Lei]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 2 ] [Feng, Shiwei]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 3 ] [Liu, Kun]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 4 ] [Zhang, Yamin]College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China

通讯作者信息:

  • 冯士维

    [feng, shiwei]college of electronic information and control engineering, beijing university of technology, beijing, china

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来源 :

Journal of Semiconductors

ISSN: 1674-4926

年份: 2015

期: 7

卷: 36

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 3

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

近30日浏览量: 2

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