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作者:

Wang, Bolun (Wang, Bolun.) | Luo, Hao (Luo, Hao.) | Wang, Xuewen (Wang, Xuewen.) | Wang, Enze (Wang, Enze.) | Sun, Yufei (Sun, Yufei.) | Tsai, Yu-Chien (Tsai, Yu-Chien.) | Zhu, Hui (Zhu, Hui.) | Liu, Peng (Liu, Peng.) | Jiang, Kaili (Jiang, Kaili.) | Liu, Kai (Liu, Kai.)

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摘要:

Structural asymmetry of materials plays a crucial role in developing multipurpose devices. Layered metallic transition metal dichalcogenides (MTMDCs) have been proposed as promising materials in electronics. However, they are still subject to native surface oxidation, limiting their practical applications. Combination of surface protection and native surface oxidation of MTMDCs will create asymmetric structures for devices but has yet to be explored. Here, we report a bifunctional NbS2 -based vertical heterostructure derived from epitaxially grown NbS2 on MoS2 followed by a natural oxidation (MoS2 -NbS2 -NbOx), which simultaneously exhibits both high-efficiency tunneling conductive and memristive surfaces. With the tunneling conductive surface, the heterostructure functions as nearly ohmic contact electrodes with a two-dimensional (2D) channel in lateral transistors, delivering an enhanced mobility similar to 140 times higher than that of the exfoliated NbS2 -contacted device. With the memristive surface, the heterostructure can be used to build high-performance lateral or vertical memristors with low working voltages and synaptic functions. By combining both types of surfaces, a memristor array for nonvolatile memory is further developed. Moreover, the memristors show a good endurance for 2000 cycles of bending as flexible devices. The bifunctional heterostructure based on NbS2 offers a strategy toward the future applications of layered metallic materials.

关键词:

native oxide heterostructure niobium disulfide electronic device epitaxial growth

作者机构:

  • [ 1 ] [Wang, Bolun]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 2 ] [Luo, Hao]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 3 ] [Wang, Xuewen]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 4 ] [Wang, Enze]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 5 ] [Sun, Yufei]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 6 ] [Liu, Kai]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China
  • [ 7 ] [Tsai, Yu-Chien]Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
  • [ 8 ] [Liu, Peng]Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
  • [ 9 ] [Jiang, Kaili]Tsinghua Univ, Dept Phys, Beijing 100084, Peoples R China
  • [ 10 ] [Tsai, Yu-Chien]Tsinghua Univ, Tsinghua Foxconn Nanotechnol Res Ctr, Beijing 100084, Peoples R China
  • [ 11 ] [Liu, Peng]Tsinghua Univ, Tsinghua Foxconn Nanotechnol Res Ctr, Beijing 100084, Peoples R China
  • [ 12 ] [Jiang, Kaili]Tsinghua Univ, Tsinghua Foxconn Nanotechnol Res Ctr, Beijing 100084, Peoples R China
  • [ 13 ] [Zhu, Hui]Beijing Univ Technol, Fac Informat Technol, Sch Microelect, Beijing 100124, Peoples R China

通讯作者信息:

  • [Liu, Kai]Tsinghua Univ, Sch Mat Sci & Engn, State Key Lab New Ceram & Fine Proc, Beijing 100084, Peoples R China

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来源 :

ACS NANO

ISSN: 1936-0851

年份: 2020

期: 1

卷: 14

页码: 175-184

1 7 . 1 0 0

JCR@2022

ESI学科: CHEMISTRY;

ESI高被引阀值:139

被引次数:

WoS核心集被引频次: 59

SCOPUS被引频次: 64

ESI高被引论文在榜: 0 展开所有

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