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作者:

Shi, Dong (Shi, Dong.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Qiao, Yanbin (Qiao, Yanbin.) | Wen, Pengyan (Wen, Pengyan.)

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摘要:

Blue GaN-based laser diodes (LDs) have been characterized by thermal infrared imaging and transient thermal technique to obtain temperature distributions along the optical resonant cavity under continuous-wave (CW) operation. The highest temperature occurred at the emitting facet and the second higher temperature occurred in the other reflecting facet under injection current I = 100 mA with platform temperature of 308.15 K. The results are attributed to the nonradiative recombination in the active region and the reabsorption of laser light inside the cavity. And due to the different of optical flow density, the highest temperature appears in emitting facet. Based on diode forward voltage with temperature, transient thermal technique is used to obtain the temperature distribution along the top-down direction of LDs by the structure function method. The thermal resistance from chip to case is 47.3 K/W. The chip's thermal resistance is the main contribution. © 2015 Elsevier Ltd. All rights reserved.

关键词:

Gallium nitride Semiconductor lasers III-V semiconductors Temperature distribution Infrared radiation Diodes Thermography (imaging)

作者机构:

  • [ 1 ] [Shi, Dong]School of Electronic Information and Control Engineering, Beijing University of Technology, Beijing; 100124, China
  • [ 2 ] [Feng, Shiwei]School of Electronic Information and Control Engineering, Beijing University of Technology, Beijing; 100124, China
  • [ 3 ] [Qiao, Yanbin]Beijing Nari Smart-Chip Microelectronics Technology Company, Ltd., Beijing; 100192, China
  • [ 4 ] [Wen, Pengyan]Suzhou Institute of Nano-tech and Nano-bionics, Chinese Academy of Sciences, Suzhou; 215123, China

通讯作者信息:

  • 冯士维

    [feng, shiwei]school of electronic information and control engineering, beijing university of technology, beijing; 100124, china

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来源 :

Solid-State Electronics

ISSN: 0038-1101

年份: 2015

卷: 109

页码: 25-28

1 . 7 0 0

JCR@2022

ESI学科: PHYSICS;

ESI高被引阀值:190

JCR分区:2

中科院分区:3

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SCOPUS被引频次: 19

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