Tungsten　(W)　is　considered　the　prime　candidate　for　plasma-facing　materials　(PFMs)　in　future　fusion　devices.　However,　the　surface　blistering　induced　by　hydrogen　isotope　irradiation　can　significantly　alter　the　surface　morphology　of　W,　thereby　severely　impacting　its　service　lifetime.　Recent　studies　have　shown　that　high　entropy　alloys　(HEAs)　exhibit　excellent　radiation　resistance.　This　work　focuses　on　investigating　the　H+　irradiation　effects　on　low-activity　W-based　HEAs.　A　composite　target　was　prepared　using　a　splicing　method,　and　WTaZrCrVTiAl　HEA　films　with　an　amorphous　structure　were　deposited　by　magnetron　sputtering.　Comparative　experiments　on　the　HEA　film　and　pure　W　film　under　H+　irradiation　conditions　revealed　that　the　blister　dose　threshold　of　the　HEA　film　far　exceeds　that　of　the　pure　W　film,　which　implies　that　they　have　more　excellent　resistance　to　H+　irradiation.