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作者:

Zhang, Yamin (Zhang, Yamin.) | Feng, Shiwei (Feng, Shiwei.) (学者:冯士维) | Zhu, Hui (Zhu, Hui.) | Gong, Xueqin (Gong, Xueqin.) | Deng, Bing (Deng, Bing.) | Ma, Lin (Ma, Lin.)

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摘要:

The effects of self-heating and traps on the drain current transient responses of AlGaN/GaN HEMTs are studied by 2D numerical simulation. The variation of the drain current simulated by the drain turn-on pulses has been analyzed. Our results show that temperature is the main factor for the drain current lag. The time that the drain current takes to reach a steady state depends on the thermal time constant, which is 80 μs in this case. The dynamics of the trapping of electron and channel electron density under drain turn-on pulse voltage are discussed in detail, which indicates that the accepter traps in the buffer are the major reason for the current collapse when the electric field significantly changes. The channel electron density has been shown to increase as the channel temperature rises. © 2014 Chinese Institute of Electronics.

关键词:

Carrier concentration Drain current Electric fields Electron density measurement Gallium nitride High electron mobility transistors Transient analysis

作者机构:

  • [ 1 ] [Zhang, Yamin]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 2 ] [Feng, Shiwei]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 3 ] [Zhu, Hui]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 4 ] [Gong, Xueqin]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 5 ] [Deng, Bing]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China
  • [ 6 ] [Ma, Lin]Institute of Semiconductor Device Reliability Physics, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing, China

通讯作者信息:

  • 冯士维

    [feng, shiwei]institute of semiconductor device reliability physics, college of electronic information and control engineering, beijing university of technology, beijing, china

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来源 :

Journal of Semiconductors

ISSN: 1674-4926

年份: 2014

期: 10

卷: 35

被引次数:

WoS核心集被引频次: 0

SCOPUS被引频次: 4

ESI高被引论文在榜: 0 展开所有

万方被引频次:

中文被引频次:

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