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作者:

Wu, Kunzhou (Wu, Kunzhou.) | Chen, Pei (Chen, Pei.) | Qin, Fei (Qin, Fei.) (学者:秦飞)

收录:

CPCI-S EI

摘要:

Silicon carbide (SiC) removal process was simulated by smoothed particle hydrodynamics and finite element method (SPH-FEM) with double diamond abrasive, SPH-FEM could prevent the influence of mesh distortion. The results show that there are three interference modes while scratching: plastic damage interference, plastic damage and lateral crack interference, and lateral crack interference. With the increase of double diamond abrasive distance, the interference region groove width increases linearly, but the interference region groove depth decreases. When the interference mode is stable, the groove depth nearly remains constant. When the interference mode changes, the maximum width to depth ratio of the interference region will change significantly. The average scratching force of SiC will fluctuate with the change of interference mode. In the lateral crack interference mode, the groove width is large, the subsurface damage is small, the width to depth ratio of the interference region is large, which means that the large width to depth ratio helps reduce subsurface damage. It is more conducive to the removal of materials and improve the surface quality after scratching.

关键词:

double diamond abrasive SiC interference region SPH-FEM

作者机构:

  • [ 1 ] [Wu, Kunzhou]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Adv Mfg Technol, Inst Elect Packaging Technol & Reliabil, Beijing, Peoples R China
  • [ 2 ] [Chen, Pei]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Adv Mfg Technol, Inst Elect Packaging Technol & Reliabil, Beijing, Peoples R China
  • [ 3 ] [Qin, Fei]Beijing Univ Technol, Fac Mat & Mfg, Beijing Key Lab Adv Mfg Technol, Inst Elect Packaging Technol & Reliabil, Beijing, Peoples R China

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来源 :

2023 24TH INTERNATIONAL CONFERENCE ON ELECTRONIC PACKAGING TECHNOLOGY, ICEPT

ISSN: 2836-9734

年份: 2023

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