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摘要:
The growth mechanism about CVD diamond films on (001) surface was studied with first-principle method which was based on density functional theory (DFT). The configurations of clean diamond surface and H-terminated diamond surface were calculated. The adsorption evolutions of H atoms and radicals (C, CH, CH2 and CH3) on the surface of diamond reconstruction and the surface of monolayer H-terminated diamond were analyzed. The results indicate that a clean diamond surface undergoes a symmetrical dimer reconstruction transformation and a monolayer H adsorbed on the surface can lead to stable of the diamond structure. In addition, H atoms can activate graphite and extract H to make a radical site when radicals are adsorbed on the diamond (001) surface. CH2 groups can better improve the growth rate of CVD diamond film than CH3 groups. CH2 group is the most efficient group in the process of CVD diamond film growth. CH group hinders the growth of CVD diamond film.
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来源 :
Journal of Materials Engineering
ISSN: 1001-4381
年份: 2014
期: 4
页码: 46-52
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