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作者:

Bai, Shi (Bai, Shi.) | Du, Yongjun (Du, Yongjun.) | Wang, Chunyan (Wang, Chunyan.) | Wu, Jian (Wu, Jian.) | Sugioka, Koji (Sugioka, Koji.)

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SCIE PubMed

摘要:

Surface-enhanced Raman spectroscopy (SERS) has advanced over the last four decades and has become an attractive tool for highly sensitive analysis in fields such as medicine and environmental monitoring. Recently, there has been an urgent demand for reusable and long-lived SERS substrates as a means of reducing the costs associated with this technique To this end, we fabricated a SERS substrate comprising a silicon nanowire array coated with silver nanoparticles, using metal-assisted chemical etching followed by photonic reduction. The morphology and growth mechanism of the SERS substrate were carefully examined and the performance of the fabricated SERS substrate was tested using rhodamine 6G and dopamine hydrochloride. The data show that this new substrate provides an enhancement factor of nearly 1 x 10(8). This work demonstrates that a silicon nanowire array coated with silver nanoparticles is sensitive and sufficiently robust to allow repeated reuse. These results suggest that this newly developed technique could allow SERS to be used in many commercial applications.

关键词:

metal assisted chemical etching nanostructure photonic reduction reusability SERS

作者机构:

  • [ 1 ] [Bai, Shi]Beijing Univ Technol, Inst Laser Engn, 100 Pingle Yuan, Beijing 100124, Peoples R China
  • [ 2 ] [Du, Yongjun]Beijing Univ Technol, Inst Laser Engn, 100 Pingle Yuan, Beijing 100124, Peoples R China
  • [ 3 ] [Wu, Jian]Beijing Univ Technol, Inst Laser Engn, 100 Pingle Yuan, Beijing 100124, Peoples R China
  • [ 4 ] [Bai, Shi]RIKEN, Ctr Adv Photon, Adv Laser Proc Res Team, 2-1 Hirosawa, Wako, Saitama 3510198, Japan
  • [ 5 ] [Sugioka, Koji]RIKEN, Ctr Adv Photon, Adv Laser Proc Res Team, 2-1 Hirosawa, Wako, Saitama 3510198, Japan
  • [ 6 ] [Wang, Chunyan]Chinese Astronaut Sci Researching & Training Ctr, State Key Lab Space Med Fundamentals & Applicat, Beijing 100094, Peoples R China

通讯作者信息:

  • [Wu, Jian]Beijing Univ Technol, Inst Laser Engn, 100 Pingle Yuan, Beijing 100124, Peoples R China;;[Sugioka, Koji]RIKEN, Ctr Adv Photon, Adv Laser Proc Res Team, 2-1 Hirosawa, Wako, Saitama 3510198, Japan

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来源 :

NANOMATERIALS

年份: 2019

期: 11

卷: 9

5 . 3 0 0

JCR@2022

ESI学科: MATERIALS SCIENCE;

ESI高被引阀值:79

JCR分区:2

被引次数:

WoS核心集被引频次: 24

SCOPUS被引频次: 23

ESI高被引论文在榜: 0 展开所有

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