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作者:

Xing, Yan-Hui (Xing, Yan-Hui.) | Li, Ying-Zhi (Li, Ying-Zhi.) | Han, Jun (Han, Jun.) | Deng, Xu-Guang (Deng, Xu-Guang.) | Ji, Yuan (Ji, Yuan.) | Xu, Chen (Xu, Chen.) (学者:徐晨) | Shen, Guang-Di (Shen, Guang-Di.)

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摘要:

The GaN hetero-epitaxial layer on sapphire (Al2O3) substrate is studied through scanning electron acoustic microscopy (SEAM) and electron backscattering diffraction (EBSD). The micro-area lattice distortion resulting from the hetero-epitaxy mismatch strain at the interface of GaN and sapphire is observed clearly, and the contrast of the micro-area in concentrated region affected by strain is different significantly. The color code map and quality parameter of the electron backscattering diffraction (EBSD) are used to analyze the variation of the mismatch strain, and the lattice strain and elastic deformation could be released within 200 nm.

关键词:

Acoustic microscopes Acoustic variables measurement Backscattering Diffraction Electron scattering Epitaxial growth Gallium nitride Sapphire Scanning electron microscopy

作者机构:

  • [ 1 ] [Xing, Yan-Hui]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Li, Ying-Zhi]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 3 ] [Han, Jun]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 4 ] [Deng, Xu-Guang]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 5 ] [Ji, Yuan]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 6 ] [Xu, Chen]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 7 ] [Shen, Guang-Di]Key Laboratory of Opto-Electronics Technology, Ministry of Education, College of Electronic Information and Control Engineering, Beijing University of Technology, Beijing 100124, China

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来源 :

Journal of Optoelectronics Laser

ISSN: 1005-0086

年份: 2012

期: 10

卷: 23

页码: 1909-1912

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WoS核心集被引频次: 0

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ESI高被引论文在榜: 0 展开所有

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