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The conical microstructures formed on the surface of Si-wafer in SF6 and upon irradiation with train of 6 ns laser pulses with a wavelength of 1064 nm was described. The Si cell optoelectric conversion efficiency of the sample which is laser treatment (sample 1) and without laser treatment (sample 2) compared with sample 1 were measured, the conversion efficiency of sample 2 increased up to 10%-15%. Primary analysis the mechanism of the changes, it possible relates to binding energy of surfeit electron and Fermi level. Find application of the Si-wafer laser treatment the Si cell technology can further improve.
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