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作者:

Hu, Chuanxin (Hu, Chuanxin.) | Ma, Jianchun (Ma, Jianchun.) | Huang, Jiqiang (Huang, Jiqiang.) | Liu, Ying (Liu, Ying.) | Shen, Chen (Shen, Chen.)

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摘要:

The conical microstructures formed on the surface of Si-wafer in SF6 and upon irradiation with train of 6 ns laser pulses with a wavelength of 1064 nm was described. The Si cell optoelectric conversion efficiency of the sample which is laser treatment (sample 1) and without laser treatment (sample 2) compared with sample 1 were measured, the conversion efficiency of sample 2 increased up to 10%-15%. Primary analysis the mechanism of the changes, it possible relates to binding energy of surfeit electron and Fermi level. Find application of the Si-wafer laser treatment the Si cell technology can further improve.

关键词:

Binding energy Cells Conversion efficiency Cytology Laser applications Silicon compounds Silicon wafers

作者机构:

  • [ 1 ] [Hu, Chuanxin]School of Material Science and Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Ma, Jianchun]Bur. of In-house Logistics State-owned Assets Supervision and Admin. Commission of the State Council, Beijing 100053, China
  • [ 3 ] [Huang, Jiqiang]Opto-Mechatronic Equipment Technology Beijing Area Major Laboratory, Beijing Institute of Petrochemical Technology, Beijing 102617, China
  • [ 4 ] [Liu, Ying]School of Environment and Engineering, Beijing University of Technology, Beijing 100124, China
  • [ 5 ] [Shen, Chen]School of Environment and Engineering, Beijing University of Technology, Beijing 100124, China

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来源 :

Infrared and Laser Engineering

ISSN: 1007-2276

年份: 2012

期: 12

卷: 41

页码: 3226-3229

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