Deposition and property characterization of indium-tin oxide films for solar cells fabrication - 文章详情页

作者：

Cui, Min (Cui, Min.) | Deng, Jinxiang (Deng, Jinxiang.) (学者：邓金祥) | Zhang, Weijia (Zhang, Weijia.) | Duan, Ping (Duan, Ping.)

收录：

EI Scopus PKU CSCD

摘要：

The　indium-tin　oxide　(ITO)　films　were　deposited　by　reactive　DC　magnetron　sputtering　on　glass　substrate.　The　impacts　of　the　film　growth　conditions,　such　as　the　oxygen　flow　rate,　pressure,　sputter　power,　deposition　rate,　and　substrate　temperature,　on　the　microstructures,　electrical　and　optical　properties　of　the　ITO　films　were　evaluated.　The　ITO　films,　to　be　used　as　the　antireflection　layer,　electrode　coatings　of　the　solar　cell,　were　grown　under　the　following　optimized　conditions:　oxygen　flow　rate　of　0.2　ml/min,　a　pressure　of　3　Pa,　a　sputtering　current　of　0.2　A,　and　its　resistivity　and　transmittance　(550　nm)　were　found　to　be　3.7×10-3　Ω·cm,　and　93.3%,　respectively.　The　solar　cells,　fabricated　with　the　ITO/n+-nc-Si:H/i-nc-Si:H/p-c-Si/Ag　structure,　possess　the　optimized　specifications,　including　an　open　circuit　voltage　Voc　of　534.7　mV,　a　short-circuit　current　Isc　of　49.24　mA(3　cm2),　and　a　fill　factor　FF　of　0.4228.

关键词：

Antireflection coatings Electric properties Film growth Flow rate Indium Indium compounds Open circuit voltage Optical properties Optimization Oxide films Oxygen Silicon Solar cells Substrates Tin Tin oxides

作者机构：

[ 1 ] [Cui, Min]Applied Physics Department, Beijing University of Technology, Beijing 100124, China
[ 2 ] [Deng, Jinxiang]Applied Physics Department, Beijing University of Technology, Beijing 100124, China
[ 3 ] [Zhang, Weijia]Center of Condensed Physics and Material Physics, School of Physics and Nuclear Engineering, Beihang University, Beijing 100191, China
[ 4 ] [Duan, Ping]Applied Physics Department, Beijing University of Technology, Beijing 100124, China

通讯作者信息：

电子邮件地址：

mcui@bjut.edu.cn

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