We　describe　a　novel　procedure　for　fabricating　conductive　patterns　on　polyvinylidene　fluoride　(PVDF)　substrates　using　KrF　excimer　laser　treatment.　Based　on　the　etching　defects　which　act　active　centre　for　conducting　layer,　the　outline　of　the　patterns　formed　by　etching　lines　is　created　on　PVDF　surfaces　via　a　248　nm　excimer　laser　direct-writing　optical　system;　the　semi-conducting　layer　can　be　induced　along　the　selective　direction,　so　that　various　patterned　conductive　surface　is　obtained　via　248　nm　laser　irradiation.　The　results　show　that　the　etching　defects　not　only　play　the　active　centres　but　also　effectively　separate　the　conducting　layer;　using　the　mask　to　limit　the　area　of　laser　irradiation　so　that　it　controls　the　outline　of　conducting　layer.　Formation　mechanism　for　conducting　layer　is　proposed　by　the　SEM　results　at　different　positions　of　conducting　layer　along　its　spreading　direction.　The　paper　will　be　possible　to　provide　guidance　for　the　conducting　PVDF　based　electronic　devices,　and　patterning　other　conducting　polymer　by　laser　techniques.