In-situ diagnosis of Ar plasma generated by unequal potential hollow cathode discharge - 文章详情页

作者：

Yang, Lizhen (Yang, Lizhen.) | Zhang, Yuefei (Zhang, Yuefei.) (学者：张跃飞) | Bian, Xinchao (Bian, Xinchao.) | Chen, Qiang (Chen, Qiang.) | Zhang, Guangqiu (Zhang, Guangqiu.)

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EI Scopus PKU CSCD

摘要：

The　argon　plasma　generated　by　unequal　potential　hollow　cathode　discharge　was　in-situ　diagnosed　by　conventional　photoemission　spectroscopy.　The　impacts　of　various　factors,　including　the　pressure,　the　source　electrode　voltage,　and　the　bias　voltage,　on　the　electron　temperature　and　electron　temperature　distributions　were　experimentally　studied.　The　results　show　that　all　three　factors　considerably　affect　the　electron　temperature.　For　instance,　as　the　bias　voltage　increases,　the　electron　temperature　first　drops　down　and　then　rises　up,　accompanied　with　a　sharp　temperature　rise;　and　the　high　electron　temperature　in　the　middle　gradually　decreases　outward.　However,　the　small　source　electrode　voltage　little　influences　the　electron　temperature.

关键词：

Argon Bias voltage Electron emission Electron temperature Emission spectroscopy Glow discharges Light emission Plasma diagnostics Stainless steel

作者机构：

[ 1 ] [Yang, Lizhen]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
[ 2 ] [Zhang, Yuefei]Institute of Microstructure and Property of Advanced Materials, Beijing University of Technology, Beijing 100022, China
[ 3 ] [Bian, Xinchao]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
[ 4 ] [Chen, Qiang]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China
[ 5 ] [Zhang, Guangqiu]Laboratory of Plasma Physics and Materials, Beijing Institute of Graphic Communication, Beijing 102600, China

通讯作者信息：

电子邮件地址：

yanglz2009@gmail.com

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