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作者:

Jin, Feifei (Jin, Feifei.) | Zhu, Xiaoli (Zhu, Xiaoli.) | Li, Hailiang (Li, Hailiang.) | Ma, Jie (Ma, Jie.) | Xie, Changqing (Xie, Changqing.) | Liu, Shibing (Liu, Shibing.) (学者:刘世炳)

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摘要:

The manufacture of high-line-density X-ray transmission self-focusing varied line-space (VLS) gratings for X-ray spectroscopy by using electron beam lithography is reported. Firstly, the VLS gratings are automatically optimized and generated by the macro program. Then using the electron beam lithography and micro-electroplating technology, the VLS gratings are fabricated on polyimide membrane substrate. The 2000 lp/mm X-ray transmission VLS gratings are successfully obtained. It can be seen that the line space of the gratings are all desired. The calibration results of diffraction efficiency of the VLS gratings indicate that the VLS gratings have promising abilities to significantly improve the diffraction intensity and spectrum resolution in the central wavelength.

关键词:

Diffraction Diffraction gratings Electron beam lithography Electron beams Electron optics X ray spectroscopy

作者机构:

  • [ 1 ] [Jin, Feifei]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 2 ] [Jin, Feifei]Institute of Laser Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 3 ] [Zhu, Xiaoli]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 4 ] [Li, Hailiang]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 5 ] [Li, Hailiang]Institute of Laser Engineering, Beijing University of Technology, Beijing 100022, China
  • [ 6 ] [Ma, Jie]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 7 ] [Xie, Changqing]Key Laboratory of Nano-Fabrication and Novel Devices Integrated Technology, Institute of Microelectronics, Chinese Academy of Sciences, Beijing 100029, China
  • [ 8 ] [Liu, Shibing]Institute of Laser Engineering, Beijing University of Technology, Beijing 100022, China

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来源 :

Acta Optica Sinica

ISSN: 0253-2239

年份: 2010

期: 6

卷: 30

页码: 1857-1860

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WoS核心集被引频次: 0

SCOPUS被引频次: 4

ESI高被引论文在榜: 0 展开所有

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