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作者:

Tian, Bo (Tian, Bo.) | Wu, Yu (Wu, Yu.) | Huang, Huai (Huang, Huai.) | Hu, Dongqing (Hu, Dongqing.) | Kang, Baowei (Kang, Baowei.)

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摘要:

A buried-oxide trench-gate bipolar-mode power JFET (BTB-JFET) facing to low voltage and high frequency switching application is presented. Power loss comparison at high frequency among 20V-rated power switching devices, including BTB-JFET, conventional trench-gate bipolar-mode JFET (TB-JFET) and trench-gate MOSFET (T-MOSFET), is carried out by means of simulation based on static analysis and mixed-mode analysis using an inductive switching circuit for the first time. Simulation results show that the gate-drain capacitance CGD of normally-on BTB-JFET has an improvement up to 25% than that of TB-JFET at zero source-drain bias. Normally-on TB-JFET has at least 14% total power loss improvement at 1MHz and 19% at 2MHz compared to that of the T-MOSFET, while normally-on BTB-JFET can provide 6% more improvement at 1 and 2MHz compared to that of the TB-JFET. Simulation results also show that the normally-off JFET always perform worse than the T-MOSFET at different frequencies. The measurement results of samples still under fabrication show that the CGD of normally-on BTB-JFET has an improvement up to 45% than that of TB-JFET at zero source-drain bias, which accords with simulation.

关键词:

Bias voltage Capacitance Facings Junction gate field effect transistors Power MOSFET Semiconductor switches Silicon on insulator technology Switching

作者机构:

  • [ 1 ] [Tian, Bo]Beijing University of Technology, Beijing 100124, China
  • [ 2 ] [Wu, Yu]Beijing University of Technology, Beijing 100124, China
  • [ 3 ] [Huang, Huai]Beijing University of Technology, Beijing 100124, China
  • [ 4 ] [Hu, Dongqing]Beijing University of Technology, Beijing 100124, China
  • [ 5 ] [Kang, Baowei]Beijing University of Technology, Beijing 100124, China

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来源 :

Transactions of China Electrotechnical Society

ISSN: 1000-6753

年份: 2009

期: 8

卷: 24

页码: 106-110

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